CVD TAC Coating

CVD TaC Coating (chemical vapor deposition tantalum carbide coating) is a coating product mainly composed of tantalum carbide (TaC). TaC coating has extremely high hardness, wear resistance, and high temperature resistance, making it an ideal choice for protecting key equipment components and improving process reliability. It is an indispensable material in semiconductor processing.

CVD TaC Coating products are usually used in reaction chambers, wafer carriers, and etching equipment, and play the following key roles in them.

CVD TaC coating is often used for internal components of reaction chambers such as substrates, wall panels, and heating elements. Combined with its excellent high temperature resistance, it can effectively resist the erosion of high temperature, corrosive gases and plasma, thereby effectively extending the service life of the equipment and ensuring the stability of the process and the purity of product production.

In addition, TaC-coated wafer carriers (such as quartz boats, fixtures, etc.) also have excellent heat resistance and chemical corrosion resistance. The wafer carrier can provide reliable support for the wafer at high temperatures, prevent wafer contamination and deformation, and thus improve the overall chip yield.

Moreover, VeTek Semiconductor's TaC coating is also widely used in various etching and thin film deposition equipment, such as plasma etchers, chemical vapor deposition systems, etc. In these processing systems, CVD TAC Coating can withstand high-energy ion bombardment and strong chemical reactions, thereby ensuring the accuracy and repeatability of the process.

Whatever your specific requirements are, we will match the best solution for your CVD TAC Coating needs and look forward to your consultation at any time.

Basic physical properties of CVD TAC Coating:

VeTek Semiconductor CVD TAC Coating products shops:

Overview of the semiconductor chip epitaxy industry chain: