China MOCVD Ceiling Manufacturer, Supplier, Factory

As a professional MOCVD Ceiling manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable MOCVD Ceiling made in China, you can leave us a message.

Hot Products

  • CVD SiC coating graphite susceptor

    CVD SiC coating graphite susceptor

    VeTek Semiconductor CVD SiC coating graphite susceptor is one of the important components in the semiconductor industry such as epitaxial growth and wafer processing. It is used in MOCVD and other equipment to support the processing and handling of wafers and other high-precision materials. VeTek Semiconductor has China's leading SiC coated graphite susceptor and TaC Coated Graphite Susceptor production and manufacturing capabilities, and looks forward to your consultation.
  • TaC Coated Graphite Susceptor

    TaC Coated Graphite Susceptor

    VeTek Semiconductor’s TaC Coated Graphite Susceptor uses chemical vapor deposition(CVD) method to prepare tantalum carbide coating on the surface of graphite parts. This process is the most mature and has the best coating properties. TaC Coated Graphite Susceptor can extend the service life of graphite components, inhibit the migration of graphite impurities, and ensure the quality of epitaxy. VeTek Semiconductor is looking forward to your inquiry.
  • Porous Graphite

    Porous Graphite

    VeTek Semiconductor is a professional manufacturer of Porous Graphite, CVD SiC coating, and CVD TAC COATING graphite susceptor in China. In fact, as a core consumable in the semiconductor manufacturing process, Porous Graphite plays an irreplaceable role in multiple links such as crystal growth, doping, and annealing. VeTek Semiconductor is committed to providing high-quality products at competitive prices, and we look forward to becoming your long-term partner in China.
  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    Vetek Semiconductor’s CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications.Looking forward to setting up long term cooperation with you.
  • SiC Coating Set Disc

    SiC Coating Set Disc

    VeTek Semiconductor, a leading manufacturer of CVD SiC coatings, offers SiC Coating Set Disc in Aixtron MOCVD Reactors. These SiC Coating Set Disc are crafted using high purity graphite and feature a CVD SiC coating with impurity below 5ppm. We welcome inquiries about this product.
  • SiC Coated MOCVD Susceptor

    SiC Coated MOCVD Susceptor

    VeTek Semiconductor's SiC Coated MOCVD Susceptor is a device with excellent process, durability and reliability. They can withstand high temperature and chemical environments, maintain stable performance and long life, thereby reducing the frequency of replacement and maintenance and improving production efficiency. Our MOCVD Epitaxial Susceptor is renowned for its high density, excellent flatness and excellent thermal control, making it the preferred equipment in harsh manufacturing environments. Looking forward to cooperating with you.

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