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    • China EPI BARREL Manufacturer, Supplier, Factory

    As a professional EPI BARREL manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable EPI BARREL made in China, you can leave us a message.

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    • Thermal spraying technology MLCC capacitor

      Thermal spraying technology MLCC capacitor

      Vetek Semiconductor thermal spraying technology plays an extremely important role in the coating application of sintered crucibles for high-end multilayer ceramic capacitor (MLCC) materials. With the continuous miniaturization and high performance of electronic devices, the demand for thermal spraying technology MLCC capacitors is also growing rapidly, especially in high-end applications. In order to meet this demand, the crucibles used in the sintering process must have excellent high temperature resistance, corrosion resistance and good thermal conductivity, all of which can be achieved and improved by thermal spraying technology. Looking forward to setting up long term business with you.
    • SiC Coated Top Plate for LPE PE2061S

      SiC Coated Top Plate for LPE PE2061S

      VeTek Semiconductor is a leading SiC Coated Top Plate for LPE PE2061S manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC Coated Top Plate for LPE PE2061S designed specifically for LPE silicon epitaxy reactor. This SiC Coated Top Plate for LPE PE2061S is the top together with barrel susceptor.This CVD SiC coated plate boasts high purity, excellent thermal stability, and uniformity, making it suitable for growing high-quality epitaxial layers.We welcome you to visit our factory in China.
    • CVD SiC Coated Skirt

      CVD SiC Coated Skirt

      VeTek Semiconductor is a leading manufacturer, innovator and leader of CVD SiC Coating and TAC Coating in China. For many years, we have been focusing on various CVD SiC Coating products such as CVD SiC coated Skirt, CVD SiC Coating Ring, CVD SiC Coating carrier, etc. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
    • Silicon Carbide Epitaxy Wafer Carrier

      Silicon Carbide Epitaxy Wafer Carrier

      VeTek Semiconductor is a leading customized Silicon Carbide Epitaxy Wafer Carrier supplier in China.We have been specialized in advanced material more than 20 years.We offer a Silicon Carbide Epitaxy Wafer Carrier for carrying SiC substrate, growing SiC epitaxy layer in SiC epitaxial reactor. This Silicon Carbide Epitaxy Wafer Carrier is an important SiC coated part of halfmoon part, high temperature resistance, oxidation resistance, wear resistance. We welcome you to visit our factory in China.
    • SiC Crystal Growth New Technology

      SiC Crystal Growth New Technology

      Vetek Semiconductor's ultra-high purity silicon carbide (SiC) formed by chemical vapor deposition (CVD) can be used as a source material for growing silicon carbide crystals by physical vapor transport (PVT). In SiC Crystal Growth New Technology, the source material is loaded into a crucible and sublimated onto a seed crystal. Use the discarded CVD-SiC blocks to recycle the material as a source for growing SiC crystals. Welcome to establish a partnership with us.
    • Wafer Chuck

      Wafer Chuck

      Vetek Semiconductor's wafer chuck play pivotal roles in semiconductor production, enabling fast, high-quality output. With in-house manufacturing, competitive pricing, and robust R&D support, Vetek Semiconductor excels in OEM/ODM services for precision components.Looking forward to your inquiry.
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      The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Why does SiC coating receive so much attention? - VeTek Semiconductor

      SiC has high hardness, thermal conductivity, and corrosion resistance, making it ideal for semiconductor manufacturing. CVD SiC coating is created through chemical vapor deposition, providing high thermal conductivity, chemical stability, and a matching lattice constant for epitaxial growth. Its low thermal expansion and high hardness ensure durability and precision, making it essential in applications like wafer carriers, preheating rings, and more. VeTek Semiconductor specializes in custom SiC coatings for diverse industry needs.

    • Exploratory application of 3D printing technology in the semiconductor industry

      In an era of rapid technological development, 3D printing, as an important representative of advanced manufacturing technology, is gradually changing the face of traditional manufacturing. With the continuous maturity of technology and the reduction of costs, 3D printing technology has shown broad application prospects in many fields such as aerospace, automobile manufacturing, medical equipment, and architectural design, and has promoted the innovation and development of these industries.

    • How much do you know about sapphire?

      This article describes that LED substrate is the largest application of sapphire, as well as the main methods of preparing sapphire crystals: growing sapphire crystals by the Czochralski method, growing sapphire crystals by the Kyropoulos method, growing sapphire crystals by the guided mold method, and growing sapphire crystals by the heat exchange method.

    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

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