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    • China CVD SIC COATING Ceiling Manufacturer, Supplier, Factory

    As a professional CVD SIC COATING Ceiling manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable CVD SIC COATING Ceiling made in China, you can leave us a message.

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    • SiC Coated ICP Etching Carrier

      SiC Coated ICP Etching Carrier

      VeTek Semiconductor's SiC Coated ICP Etching Carrier is designed for the most demanding epitaxy equipment applications. Made of high-quality ultra-pure graphite material, our SiC Coated ICP Etching Carrier has a highly flat surface and excellent corrosion resistance to withstand the harsh conditions during handling. The high thermal conductivity of the SiC coated carrier ensures even heat distribution for excellent etching results. VeTek Semiconductor looks forward to building a long-term partnership with you.
    • Glassy Carbon Coated Graphite Crucible

      Glassy Carbon Coated Graphite Crucible

      VeTek Semiconductor is a leading supplier of customized Glassy Carbon Coated Graphite Crucible in China, specializing in glassy carbon materials for many years.Our Glassy Carbon Coated Graphite Crucible is meticulously engineered to deliver exceptional performance specifically for E-beam Guns, silicon single crystal pulling, epitaxy. It offers enhanced durability against scratching and other friction, also reduces the generation of dust.Welcome to visit us.
    • SiC Crystal Growth Porous Graphite

      SiC Crystal Growth Porous Graphite

      As the leading SiC Crystal Growth Porous Graphite manufacturer and leader in China's semiconductor industry, VeTek Semiconductor has been focusing on various Porous Graphite products for many years, such as Porous graphite crucible, High Purity Porous Graphite, SiC Crystal Growth Porous Graphite, Porous Graphite with TaC Coated's investment and R&D, our Porous Graphite products have won high praise from European and American customers. We sincerely look forward to becoming your partner in China.
    • LED EPI Susceptor

      LED EPI Susceptor

      VeTek Semiconductor is a leading supplier of TaC coatings and SiC coating graphite parts. We specialize in the production of cutting-edge LED EPI Susceptors, essential for LED epitaxy processes. With a strong focus on innovation and quality, we offer reliable solutions that meet the stringent requirements of the LED industry. Contact us today to discuss your inquiries and discover how our products can enhance your manufacturing processes.
    • Silicon Carbide Ceramic Coating

      Silicon Carbide Ceramic Coating

      As a professional Silicon Carbide Ceramic Coating manufacturer and supplier in China, Vetek Semiconductor's Silicon Carbide Ceramic Coating is widely used on key components of semiconductor manufacturing equipment, especially when CVD and PECVD processes are involved. Welcome your inquiry.
    • CVD SiC Block for SiC Crystal Growth

      CVD SiC Block for SiC Crystal Growth

      VeTek Semiconductor focuses on the research and development and industrialization of CVD-SiC bulk sources, CVD SiC coatings, and CVD TaC coatings. Taking CVD SiC block for SiC Crystal Growth as an example, the product processing technology is advanced, the growth rate is fast, high temperature resistance, and corrosion resistance are strong. Welcome to inquire.
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    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • How thin can the Taiko process make silicon wafers?

      The Taiko process thins silicon wafers using its principles, technical advantages and process origins.

    • The Development History of 3C SiC

      Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

    • Uses of solid silicon carbide

      Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

    • Sanan Optoelectronics Co., Ltd.: 8-inch SiC chips are expected to be put into production in December!

      As a leading manufacturer in the SiC industry, Sanan Optoelectronics' related dynamics have received widespread attention in the industry. Recently, Sanan Optoelectronics disclosed a series of latest developments, involving 8-inch transformation, new substrate factory production, establishment of new companies, government subsidies and other aspects.

    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

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