VeTek Semiconductor is a leading manufacturer and innovator of TaC Coating Heater in China. This product has an extremely high melting point (about 3880°C). The high melting point of TaC Coating Heater enables it to operate at extremely high temperatures, especially in the growth of gallium nitride (GaN) epitaxial layers in the metal organic chemical vapor deposition (MOCVD) process. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. We look forward to becoming your long-term partner in China.
TaC Coating Heater is a high-performance heating element widely used in semiconductor manufacturing processes. Its surface is coated with tantalum carbide (TaC) material, which gives the heater excellent high temperature resistance, chemical corrosion resistance and excellent thermal conductivity.
The main applications of TaC Coating Heater in semiconductor manufacturing include:
During the gallium nitride (GaN) epitaxial growth process, TaC Coating Heater provides a precisely controlled high temperature environment to ensure that the epitaxial layer is deposited on the substrate at a uniform rate and high quality. Its stable heat output helps to achieve precise control of thin film materials, thereby improving device performance.
Moreover, in the metal organic chemical vapor deposition (MOCVD) process, combined with the high temperature resistance and thermal conductivity of the TaC coating, the TaC Coating Heater is usually used to heat the reaction gas, and by providing uniform heat distribution, it promotes its chemical reaction on the substrate surface, thereby improving the uniformity of the epitaxial layer and forming a high-quality film.
As an industry leader in TaC Coating Heater products, VeTek Semiconducto always supports product customization services and satisfactory product prices. No matter what your specific requirements are, we will match the best solution for your TaC Coating Heater needs, and look forward to your consultation at any time.
Physical properties of TaC coating | |
Density | 14.3 (g/cm³) |
Specific emissivity | 0.3 |
Thermal expansion coefficient | 6.3 10-6/K |
Hardness (HK) | 2000 HK |
Resistance | 1×10-5 Ohm*cm |
Thermal stability | <2500℃ |
Graphite size changes | -10~-20um |
Coating thickness | ≥20um typical value (35um±10um) |