As a professional Tantalum Carbide Coating Support product manufacturer and factory in China, VeTek Semiconductor Tantalum Carbide Coating Support is usually used for surface coating of structural components or support components in semiconductor equipment, especially for surface protection of key equipment components in semiconductor manufacturing processes such as CVD and PVD. Welcome your further consultation.
The main function of VeTek Semiconductor Tantalum Carbide (TaC) Coating Support is to improve the heat resistance, wear resistance and corrosion resistance of the substrate by coating a layer of Tantalum Carbide Coating, so as to improve the accuracy and reliability of the process and extend the service life of the components. It is a high-performance coating product used in the field of semiconductor processing.
VeTek Semiconductor's Tantalum Carbide Coating Suppor has a Mohs hardness of nearly 9~10, second only to diamond. It has extremely strong wear resistance and can effectively resist surface wear and impact during processing, thereby effectively extending the service life of equipment components. Combined with its high melting point of about 3880°C, it is often used for coating key components of semiconductor equipment, such as surface coatings of support structures, heat treatment equipment, chambers or gaskets in semiconductor equipment to enhance its wear resistance and high temperature resistance.
Due to the extremely high melting point of Tantalum Carbide of about 3880°C, in semiconductor processing processes such as chemical vapor deposition (CVD) and physical vapor deposition (PVD), TaC Coating with strong high temperature resistance and chemical corrosion resistance can effectively protect equipment components and prevent corrosion or damage to the substrate in extreme environments, providing effective protection for high temperature environments in wafer manufacturing. This feature also determines that VeTek Semiconductor's Tantalum Carbide Coating Support is often used in etching and corrosive processes.
Tantalum Carbide Coating Support also has the function of reducing particle contamination. During wafer processing, surface wear usually produces particulate contamination, which affects the product quality of the wafer. TaC Coating's extreme product characteristics of close to 9-10 Mohs hardness can effectively reduce this wear, thereby reducing the generation of particles. Combined with TaC Coating's excellent thermal conductivity (about 21 W/m·K), it can maintain good thermal conductivity under high temperature conditions, thereby greatly improving the yield and consistency of wafer manufacturing.
VeTek Semiconductor's main TaC Coating products include TaC Coating Heater, CVD TaC Coating Crucible, TaC Coating Rotation Susceptor and TaC Coating Spare Part, etc., and support customized product services. VeTek Semiconductor is committed to providing excellent products and technical solutions for the semiconductor industry. We sincerely hope to become your long-term partner in China.
Tantalum carbide (TaC) coating on a microscopic cross-section:
Basic physical properties of CVD TaC coating:
Physical properties of TaC coating |
|
Density |
14.3 (g/cm³) |
Specific emissivity |
0.3 |
Thermal expansion coefficient |
6.3*10-6/K |
Hardness (HK) |
2000HK |
Resistance |
1×10-5 Ohm*cm |
Thermal stability |
<2500℃ |
Graphite size changes |
-10~-20um |
Coating thickness |
≥20um typical value (35um±10um) |