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  • TaC Coated Three-petal Ring

    • China TaC Coated Three-petal Ring Manufacturer, Supplier, Factory

    As a professional TaC Coated Three-petal Ring manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable TaC Coated Three-petal Ring made in China, you can leave us a message.

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    • TaC Coating Guide Ring

      TaC Coating Guide Ring

      VeTek Semiconductor's TaC Coating Guide Ring is created by applying tantalum carbide coating onto graphite parts using a highly advanced technique called chemical vapor deposition (CVD). This method is well-established and offers exceptional coating properties. By utilizing the TaC Coating Guide Ring, the lifespan of graphite components can be significantly extended, the movement of graphite impurities can be suppressed, and the SiC and AIN single crystal quality can be reliably maintained. Welcome to inquiry us.
    • Semiconductor Fused Quartz Ring

      Semiconductor Fused Quartz Ring

      VeTeksemi's semiconductor fused quartz ring is an indispensable core component in the semiconductor etching process, with excellent purity, extremely high thermal stability and outstanding chemical resistance.Welcome your further inquiry.
    • GaN on SiC epi susceptor

      GaN on SiC epi susceptor

      VeTek Semiconductor is a professional manufacturer of GaN on SiC epi susceptor, CVD SiC coating, and CVD TAC COATING graphite susceptor in China. Among them, GaN on SiC epi susceptor plays a vital role in semiconductor processing. Through its excellent thermal conductivity, high temperature processing ability and chemical stability, it ensures the high efficiency and material quality of the GaN epitaxial growth process. We sincerely look forward to your further consultation.
    • Three-petal Graphite Crucible

      Three-petal Graphite Crucible

      VeTek Semiconductor's Three-petal Graphite Crucible is a special container designed for the thermal treatment of semiconductor materials, especially for the production of single crystals. It plays a vital role in controlling the growth of single crystal structures required for the manufacture of semiconductor devices. VeTek Semiconductor's looks forward to becoming your long-term partner in China.
    • Chemical Vapor Deposition Process Solid SiC Edge Ring

      Chemical Vapor Deposition Process Solid SiC Edge Ring

      VeTek Semiconductor is a leading Chemical Vapor Deposition Process Solid SiC Edge Ring manufacturer and innovator in China.We have been specialized in semiconductor material for many years.VeTek Semiconductor solid SiC edge ring offers improved etching uniformity and precise wafer positioning when used with an electrostatic chuck, ensuring consistent and reliable etching results.We look forward to becoming your long-term partner in China.
    • LPE Halfmoon SiC EPI Reactor

      LPE Halfmoon SiC EPI Reactor

      VeTek Semiconductor is a professional LPE Halfmoon SiC EPI Reactor product manufacturer, innovator and leader in China. LPE Halfmoon SiC EPI Reactor is a device specifically designed for producing high-quality silicon carbide (SiC) epitaxial layers, mainly used in the semiconductor industry. VeTek Semiconductor is committed to providing leading technology and product solutions for the semiconductor industry, and welcomes your further inquiries.
    • Related Blog
    • Reviews

    • Silicon carbide nanomaterials

      Silicon carbide nanomaterials (SiC) are materials with at least one dimension at the nanometer scale (1-100nm). These materials can be zero-, one-, two-, or three-dimensional and have diverse applications.

    • What is semiconductor epitaxy process?

      It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

    • The Development History of 3C SiC

      Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

    • What are the differences between MBE and MOCVD technologies?

      This article mainly discusses the respective process advantages and differences of Molecular Beam Epitaxy process and Metal-organic chemical vapour deposition technologies.

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