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  • SiN ceramic plate

    • China SiN ceramic plate Manufacturer, Supplier, Factory

    As a professional SiN ceramic plate manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiN ceramic plate made in China, you can leave us a message.

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    • CVD SiC Coated Wafer Barrel Holder

      CVD SiC Coated Wafer Barrel Holder

      CVD SiC coated wafer Barrel holder is the key component of epitaxial growth furnace, widely used in MOCVD epitaxial growth furnaces. VeTek Semiconductor provides you with highly customized products. No matter what your needs are for CVD SiC coated wafer Barrel holder, Welcome to consult us.
    • High purity SiC wafer boat carrier

      High purity SiC wafer boat carrier

      VeTek Semiconductor offers customized High purity SiC wafer boat carrier. Made of high purity silicon carbide, it features slots to hold the wafer in place, preventing it from sliding during processing. CVD SiC coating is also available if required. As a professional and strong semiconductor manufacturer and supplier, VeTek Semiconductor's High purity SiC wafer boat carrier is price competitive and high quality. VeTek Semiconductor looks forward to being your long-term partner in China.
    • Solid SiC Etching Focusing Ring

      Solid SiC Etching Focusing Ring

      VeTek Semiconductor is a leading Solid SiC Etching Focusing Ring manufacturer and innovator in China.We have been specialized in SiC material for many years.Solid SiC is chosen as a focusing ring material due to its excellent thermochemical stability, high mechanical strength and resistance to plasma erosion.We look forward to becoming your long-term partner in China.
    • ALD Susceptor

      ALD Susceptor

      VeTek Semiconductor is a professional manufacturer of ALD Susceptor, CVD SiC coating, CVD TAC COATING graphite base in China. Vetek Semiconductor jointly developed and produced SiC-coated ALD planetary bases with ALD system manufacturers to meet the high requirements of the ALD process and evenly distribute the air flow on the substrate. We look forward to further cooperation with you.
    • silicon carbide ceramic coating heater

      silicon carbide ceramic coating heater

      VeTek Semiconductor is a professional silicon carbide ceramic coating heater manufacturer in China. The silicon carbide ceramic coating heater is mainly designed for the high temperature and harsh environment of semiconductor manufacturing. Its ultra-high melting point, excellent corrosion resistance and outstanding thermal conductivity determine the indispensability of this product in the semiconductor production process. We sincerely hope to establish a long-term business relationship with you.
    • SiC Coated Support Ring

      SiC Coated Support Ring

      VeTek Semiconductor is a professional China manufacturer and supplier, mainly producing SiC coated support rings, CVD silicon carbide (SiC) coatings, tantalum carbide (TaC) coatings, bulk SiC, SiC powders and high-purity SiC materials. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry, welcome to contact us.
    • Related Blog
    • Reviews

    • What is the difference between CVD TaC and sintered TaC?

      This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • How to prepare CVD TaC coating?

      This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

    • Uses of solid silicon carbide

      Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

    • Semiconductor process: Chemical Vapor Deposition (CVD)

      Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

    • Material of silicon carbide epitaxy

      The material of silicon carbide epitaxial layer is silicon carbide, which is usually used to manufacture high-power electronic devices and LEDs. It is widely used in the semiconductor industry due to its excellent thermal stability, mechanical strength and high electrical conductivity.

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