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  • Silicon single Crystal Crucible

    • China Silicon single Crystal Crucible Manufacturer, Supplier, Factory

    As a professional Silicon single Crystal Crucible manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon single Crystal Crucible made in China, you can leave us a message.

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    • Chemical Vapor Deposition Process Solid SiC Edge Ring

      Chemical Vapor Deposition Process Solid SiC Edge Ring

      VeTek Semiconductor is a leading Chemical Vapor Deposition Process Solid SiC Edge Ring manufacturer and innovator in China.We have been specialized in semiconductor material for many years.VeTek Semiconductor solid SiC edge ring offers improved etching uniformity and precise wafer positioning when used with an electrostatic chuck, ensuring consistent and reliable etching results.We look forward to becoming your long-term partner in China.
    • CVD SiC Coated Ceiling

      CVD SiC Coated Ceiling

      As a professional CVD SiC coated ceiling manufacturer and supplier in China, VeTek Semiconductor's CVD SiC coated ceiling has excellent properties such as high temperature resistance, corrosion resistance, high hardness, and low thermal expansion coefficient, making it an ideal material choice in semiconductor manufacturing. We look forward to further cooperation with you.
    • Porous Graphite with TaC Coated

      Porous Graphite with TaC Coated

      Porous Graphite with TaC Coated is an advanced semiconductor processing material provided by VeTek Semiconductor. Porous Graphite with TaC Coated combines the advantages of porous graphite and tantalum carbide (TaC) coating, with good thermal conductivity and gas permeability. VeTek Semiconductor is committed to providing quality products at competitive prices, and we look forward to being your long-term partner in China.
    • Ultra Pure Silicon Carbide Powder for Crystal Growth

      Ultra Pure Silicon Carbide Powder for Crystal Growth

      VeTek Semiconductor is a professional manufacturer and supplier, dedicated to providing high-quality Ultra Pure Silicon Carbide Powder for Crystal Growth. With a purity of up to 99.999% wt and extremely low impurity levels of nitrogen, boron, aluminum, and other contaminants, it is specifically designed to enhance the semi-insulating properties of high-purity silicon carbide. Welcome to inquire and cooperate with us!
    • TaC Coating Spare Part

      TaC Coating Spare Part

      VeTek Semiconductor is a professional manufacturer of TaC Coating Plate and other TaC Coating spare parts in China. TaC Coating is currently mainly used in processes such as silicon carbide single crystal growth (PVT method), epitaxial disk (including silicon carbide epitaxy, LED epitaxy), etc. Combined with the good long-term stability of TaC Coating Plate, VeTek Semiconductor TaC Coating Plate has become the benchmark for TaC Coating spare parts. We look forward to you becoming our long-term partner.
    • Vitreous Carbon Coated Graphite Crucible for E-beam Gun

      Vitreous Carbon Coated Graphite Crucible for E-beam Gun

      VeTek Semiconductor is a leading supplier of customized Vitreous Carbon Coated Graphite Crucible for E-beam Gun in China, specializing in advanced materials for many years. Our Vitreous Carbon Coated Graphite Crucible is specifically designed for E-beam Gun, ensuring excellent performance. Made from ultra-pure imported graphite, it offers reliability and durability. Visit our factory in China to explore deep cooperation.
    • Related Blog
    • Reviews

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

    • Roll up! Two major manufacturers are about to mass produce 8-inch silicon carbide

      As the 8-inch silicon carbide (SiC) process matures, manufacturers are accelerating the shift from 6-inch to 8-inch. Recently, ON Semiconductor and Resonac announced updates on 8-inch SiC production.

    • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

      In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

    • How thin can the Taiko process make silicon wafers?

      The Taiko process thins silicon wafers using its principles, technical advantages and process origins.

    • Characteristics of silicon epitaxy

      High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

    • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

      SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

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