CVD TaC Coating Carrier

VeTek Semiconductor is a professional leader China CVD TaC Coating carrier, EPITAXY SUSCEPTOR, TaC Coated Graphite Susceptor manufacturer.

Through continuous process and material innovation research, Vetek Semiconductor's CVD TaC coating carrier plays a very critical role in the epitaxial process, mainly including the following aspects:

Substrate protection: CVD TaC coating carrier provides excellent chemical stability and thermal stability, effectively preventing high temperature and corrosive gases from eroding the substrate and the inner wall of the reactor, ensuring the purity and stability of the process environment.

Thermal uniformity: Combined with the high thermal conductivity of the CVD TaC coating carrier, it ensures the uniformity of temperature distribution within the reactor, optimizes the crystal quality and thickness uniformity of the epitaxial layer, and enhances the performance consistency of the final product.

Particle contamination control: Since CVD TaC coated carriers have extremely low particle generation rates, the smooth surface properties significantly reduce the risk of particle contamination, thereby improving purity and yield during epitaxial growth.

Extended equipment life: Combined with the excellent wear resistance and corrosion resistance of the CVD TaC coating carrier, it significantly extends the service life of the reaction chamber components, reduces equipment downtime and maintenance costs, and improves production efficiency.

Combining the above characteristics, VeTek Semiconductor's CVD TaC Coating carrier not only improves the reliability of the process and the quality of the product in the epitaxial growth process, but also provides a cost-effective solution for semiconductor manufacturing.

Tantalum carbide coating on a microscopic cross section:

Physical properties of CVD TaC Coating Carrier:

VeTek Semiconductor CVD SiC Coating Production Shop: