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    • China Silicon Based Epitaxy Manufacturer, Supplier, Factory

    As a professional Silicon Based Epitaxy manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Based Epitaxy made in China, you can leave us a message.

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    • Tantalum Carbide Coating Support

      Tantalum Carbide Coating Support

      As a professional Tantalum Carbide Coating Support product manufacturer and factory in China, VeTek Semiconductor Tantalum Carbide Coating Support is usually used for surface coating of structural components or support components in semiconductor equipment, especially for surface protection of key equipment components in semiconductor manufacturing processes such as CVD and PVD. Welcome your further consultation.
    • CVD SiC coating Epitaxy susceptor

      CVD SiC coating Epitaxy susceptor

      VeTek Semiconductor's CVD SiC Coating Epitaxy Susceptor is a precision-engineered tool designed for semiconductor wafer handling and processing. This SiC Coating Epitaxy Susceptor plays a vital role in promoting the growth of thin films, epilayers, and other coatings, and can precisely control temperature and material properties. Welcome your further inquiries.
    • Silicon Carbide Ceramic Coating

      Silicon Carbide Ceramic Coating

      As a professional Silicon Carbide Ceramic Coating manufacturer and supplier in China, Vetek Semiconductor's Silicon Carbide Ceramic Coating is widely used on key components of semiconductor manufacturing equipment, especially when CVD and PECVD processes are involved. Welcome your inquiry.
    • TaC Coated Chuck

      TaC Coated Chuck

      As a professional TaC Coated Chuck manufacturer and supplier in China, VeTek Semiconductor's TaC Coating Chuck is specifically designed for semiconductor furnaces. With its high temperature resistance, chemical inertness and excellent performance, Vetek Semiconductor's innovative technology provides a reliable solution for the semiconductor manufacturing industry to ensure hig-quality production standards. We believe that our products can bring you advanced technology and high-quality product solutions.
    • CVD TaC Coating Wafer Carrier

      CVD TaC Coating Wafer Carrier

      As a professional CVD TaC Coating Wafer Carrier product manufacturer and factory in China, VeTek Semiconductor CVD TaC Coating Wafer Carrier is a wafer carrying tool specially designed for high temperature and corrosive environments in semiconductor manufacturing. and CVD TaC Coating Wafer Carrier has high mechanical strength, excellent corrosion resistance and thermal stability, providing the necessary guarantee for manufacturing high-quality semiconductor devices. Your further inquiries are welcome.
    • Si EPI Susceptor

      Si EPI Susceptor

      VeTek Semiconductor is a factory that combines precision machining and semiconductor SiC and TaC coating capabilities. The barrel type Si Epi Susceptor provides temperature and atmosphere control capabilities, enhancing production efficiency in semiconductor epitaxial growth processes.Looking forward to setting up cooperation relationship with you.
    • Related Blog
    • Reviews

    • Semiconductor process: Chemical Vapor Deposition (CVD)

      Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

      In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

    • The Problems in the Etching Process

      Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

    • Roll up! Two major manufacturers are about to mass produce 8-inch silicon carbide

      As the 8-inch silicon carbide (SiC) process matures, manufacturers are accelerating the shift from 6-inch to 8-inch. Recently, ON Semiconductor and Resonac announced updates on 8-inch SiC production.

    • Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

      Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.

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