SiC Coated Top Plate for LPE PE2061S

VeTek Semiconductor is a professional China SiC Coated Top Plate for LPE PE2061S manufacturer and supplier.

The VeTeK Semiconductor SiC Coated Top Plate for LPE PE2061S in silicon epitaxial equipment, used in conjunction with a barrel type body susceptor to support and hold the epitaxial wafers (or substrates) during the epitaxial growth process.

The SiC Coated Top Plate for LPE PE2061S is typically made of high-temperature stable graphite material. VeTek Semiconductor carefully considers factors such as thermal expansion coefficient when selecting the most suitable graphite material, ensuring a strong bond with the silicon carbide coating.

The SiC Coated Top Plate for LPE PE2061S exhibits excellent thermal stability and chemical resistance to withstand the high-temperature and corrosive environment during epitaxy growth. This ensures long-term stability, reliability, and protection of the wafers.

In silicon epitaxial equipment, the primary function of the whole CVD SiC coated reactor is to support the wafers and provide a uniform substrate surface for the growth of epitaxial layers. Additionally, it allows for adjustments in the position and orientation of the wafers, facilitating control over temperature and fluid dynamics during the growth process to achieve desired growth conditions and epitaxial layer characteristics.

VeTek Semiconductor's products offer high precision and uniform coating thickness. The incorporation of a buffer layer also extends the product's lifespan. in silicon epitaxial equipment, used in conjunction with a barrel-type body susceptor to support and hold the epitaxial wafers (or substrates) during the epitaxial growth process.

Basic physical properties of CVD SiC coating:

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Overview of the semiconductor chip epitaxy industry chain: