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    • China SiC Furnace Tube Manufacturer, Supplier, Factory

    As a professional SiC Furnace Tube manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC Furnace Tube made in China, you can leave us a message.

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    • CVD SiC Shower Head

      CVD SiC Shower Head

      VeTek Semiconductor is a leading CVD SiC Shower Head manufacturer and innovator in China.We have been specialized in SiC material for many years.CVD SiC Shower Head is chosen as a focusing ring material due to its excellent thermochemical stability, high mechanical strength and resistance to plasma erosion.We look forward to becoming your long-term partner in China.
    • Physical Vapor Deposition

      Physical Vapor Deposition

      Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
    • Chemical Vapor Deposition Process Solid SiC Edge Ring

      Chemical Vapor Deposition Process Solid SiC Edge Ring

      VeTek Semiconductor is a leading Chemical Vapor Deposition Process Solid SiC Edge Ring manufacturer and innovator in China.We have been specialized in semiconductor material for many years.VeTek Semiconductor solid SiC edge ring offers improved etching uniformity and precise wafer positioning when used with an electrostatic chuck, ensuring consistent and reliable etching results.We look forward to becoming your long-term partner in China.
    • SiC Coated Epi Susceptor

      SiC Coated Epi Susceptor

      As the top domestic manufacturer of silicon carbide and tantalum carbide coatings, VeTek Semiconductor is able to provide precision machining and uniform coating of SiC Coated Epi Susceptor, effectively controlling the purity of coating and product below 5ppm. The product life is comparable to that of SGL. Welcome to inquire us.
    • Alumina Ceramic Vacuum Chuck

      Alumina Ceramic Vacuum Chuck

      VeTek Semiconductor is a professional Alumina Ceramic Vacuum Chuck manufacturer and factory in China. Alumina Ceramic Vacuum Chuck uses high-purity aluminum oxide ceramics with excellent heat resistance, chemical resistance and mechanical strength. It is mainly used to fix and support wafers and substrates. It is a high-performance equipment for semiconductor processing. Welcome your further inquiries.
    • Three-petal Graphite Crucible

      Three-petal Graphite Crucible

      VeTek Semiconductor's Three-petal Graphite Crucible is a special container designed for the thermal treatment of semiconductor materials, especially for the production of single crystals. It plays a vital role in controlling the growth of single crystal structures required for the manufacture of semiconductor devices. VeTek Semiconductor's looks forward to becoming your long-term partner in China.
    • Related Blog
    • Reviews

    • Sanan Optoelectronics Co., Ltd.: 8-inch SiC chips are expected to be put into production in December!

      As a leading manufacturer in the SiC industry, Sanan Optoelectronics' related dynamics have received widespread attention in the industry. Recently, Sanan Optoelectronics disclosed a series of latest developments, involving 8-inch transformation, new substrate factory production, establishment of new companies, government subsidies and other aspects.

    • 8-inch SiC epitaxial furnace and homoepitaxial process research

      8-inch SiC epitaxial furnace and homoepitaxial process research

    • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

      In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

    • Chip manufacturing: A process flow of MOSFET

      The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

    • Application of carbon-based thermal field materials in silicon carbide crystal growth

      Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

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