CVD SiC Coating Baffle

Vetek Semiconductor's CVD SiC Coating Baffle is mainly used in Si Epitaxy. It is usually used with silicon extension barrels. It combines the unique high temperature and stability of the CVD SiC Coating Baffle, which greatly improves the uniform distribution of airflow in semiconductor manufacturing. We believe that our products can bring you Advanced Technology and High-Quality Product Solutions.

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Product Description

As the professional manufacturer, we would like to provide you high quality CVD SiC Coating Baffle.

Through continuous process and material innovation development, Vetek Semiconductor's CVD SiC Coating Baffle has the unique characteristics of high temperature stability, corrosion resistance, high hardness and wear resistance. These unique characteristics determine that CVD SiC Coating Baffle plays an important role in the epitaxial process, and its role mainly includes the following aspects:

Uniform distribution of airflow: The ingenious design of CVD SiC Coating Baffle can achieve uniform distribution of airflow during the epitaxy process. Uniform airflow is essential for uniform growth and quality improvement of materials. The product can effectively guide the airflow, avoid excessive or weak local airflow, and ensure the uniformity of epitaxial materials.

Control the epitaxy process: The position and design of CVD SiC Coating Baffle can accurately control the flow direction and speed of airflow during the epitaxy process. By adjusting its layout and shape, precise control of airflow can be achieved, thereby optimizing epitaxy conditions and improving epitaxy yield and quality.

Reduce material loss: Reasonable setting of CVD SiC Coating Baffle can reduce material loss during the epitaxy process. Uniform airflow distribution can reduce thermal stress caused by uneven heating, reduce the risk of material breakage and damage, and extend the service life of epitaxial materials.

Improve epitaxy efficiency: The design of CVD SiC Coating Baffle can optimize airflow transmission efficiency and improve the efficiency and stability of the epitaxy process. Through the use of this product, the functions of epitaxial equipment can be maximized, production efficiency can be improved and energy consumption can be reduced.

Basic physical properties of CVD SiC Coating Baffle：