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    • China SiC EPI susceptor Manufacturer, Supplier, Factory

    As a professional SiC EPI susceptor manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC EPI susceptor made in China, you can leave us a message.

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    • CVD SiC Coating Nozzle

      CVD SiC Coating Nozzle

      Vetek Semiconductor’s CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications.Looking forward to setting up long term cooperation with you.
    • Tantalum Carbide Coated Cover

      Tantalum Carbide Coated Cover

      VeTek Semiconductor is a leading Tantalum Carbide Coated Cover manufacturer and innovator in China.We have been specialized in TaC and SiC coating for many years.Our products have a corrosion resistance, high strength. We look forward to becoming your long-term partner in China.
    • TaC Coated Three-petal Ring

      TaC Coated Three-petal Ring

      VeTek Semiconductor is a leading TaC Coated Three-petal Ring manufacturer and innovator in China.We have been specialized in TaC and SiC coating for many years.Our products have a corrosion resistance, high strength. We look forward to becoming your long-term partner in China.
    • SiC Coated Graphite Barrel Susceptor for EPI

      SiC Coated Graphite Barrel Susceptor for EPI

      VeTek Semiconductor is a professional manufacturer, supplier and exporter for the SiC coated graphite barrel susceptor for EPI. Supported by a professional team and leading technology, VeTek Semiconductor can provide you high quality at reasonable prices. we welcome you to visit our factory for further discussion.
    • CVD SiC Coating Protector

      CVD SiC Coating Protector

      Vetek Semiconductor provides CVD SiC Coating Protector used is LPE SiC epitaxy, The term "LPE" usually refers to Low Pressure Epitaxy (LPE) in Low Pressure Chemical Vapor Deposition (LPCVD). In semiconductor manufacturing, LPE is an important process technology for growing single crystal thin films, often used to grow silicon epitaxial layers or other semiconductor epitaxial layers.Pls no hesitate to contact us for more questions.
    • Graphite Rotating Susceptor

      Graphite Rotating Susceptor

      High purity graphite rotating susceptor plays an important role in the epitaxial growth of gallium nitride (MOCVD process). VeTek Semiconductor is a leading graphite rotating susceptor manufacturer and supplier in China. We have developed many high-purity graphite products based on high-purity graphite materials, which fully meet the requirements of the semiconductor industry. VeTek Semiconductor looks forward to becoming your partner in Rotating Graphite susceptor.
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    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • Diamond - the future star of semiconductors

      Diamond, a potential fourth-generation "ultimate semiconductor," is gaining attention in semiconductor substrates due to its exceptional hardness, thermal conductivity, and electrical properties. While its high cost and production challenges limit its use, CVD is the preferred method. Despite doping and large-area crystal challenges, diamond holds promise.

    • Why does SiC coating receive so much attention? - VeTek Semiconductor

      SiC has high hardness, thermal conductivity, and corrosion resistance, making it ideal for semiconductor manufacturing. CVD SiC coating is created through chemical vapor deposition, providing high thermal conductivity, chemical stability, and a matching lattice constant for epitaxial growth. Its low thermal expansion and high hardness ensure durability and precision, making it essential in applications like wafer carriers, preheating rings, and more. VeTek Semiconductor specializes in custom SiC coatings for diverse industry needs.

    • Semiconductor substrate wafer: Material properties of silicon, GaAs, SiC and GaN

      The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

    • 8-inch SiC epitaxial furnace and homoepitaxial process research

      8-inch SiC epitaxial furnace and homoepitaxial process research

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

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