China SiC coating halfmoon graphite parts Manufacturer, Supplier, Factory

VeTek Semiconductor's SiC Cantilever Paddle is a very high performance product. Our SiC Cantilever Paddle is usually used in heat treatment furnaces for handling and supporting silicon wafers, chemical vapor deposition (CVD) and other processing processes in semiconductor manufacturing processes. The high temperature stability and high thermal conductivity of SiC material ensure high efficiency and reliability in the semiconductor processing process. We are committed to providing high-quality products at competitive prices and look forward to becoming your long-term partner in China.

VeTek Semiconductor is a leading Solid SiC Gas Shower Head manufacturer and innovator in China.We have been specialized in semiconductor material for many years.VeTek Semiconductor Solid SiC Gas Shower Head’s multi-porosity design ensures that the heat generated in the CVD process can be dispersed, ensuring that the substrate is heated evenly.We look forward to setting up long-term with you in China.

VeTek Semiconductor is a large-scale Tantalum Carbide Coated Halfmoon Part for LPE manufacturer and innovator in China.We have been specialized in TaC coating for many years.Our products can withstand temperatures above 2000 degrees Celsius, prolong the lifespan of consumables.We look forward to becoming your long-term partner in China.

As a leading GaN epitaxial susceptor supplier and manufacturer in China, VeTek semiconductor GaN epitaxial susceptor is a high-precision susceptor designed for GaN epitaxial growth process, used to support epitaxial equipment such as CVD and MOCVD. In the manufacturing of GaN devices (such as power electronic devices, RF devices, LEDs, etc.), GaN epitaxial susceptor carries the substrate and achieves high-quality deposition of GaN thin films under high temperature environment. Welcome your further inquiry.

VeTek Semiconductor's Silicon Carbide Cantilever Paddle is an important component in the semiconductor manufacturing process, especially suitable for diffusion furnaces or LPCVD furnaces in high-temperature processes such as diffusion and RTP. Our Silicon Carbide Cantilever Paddle is carefully designed and manufactured with excellent high-temperature resistance and mechanical strength, and can safely and reliably transport wafers to the process tube under harsh process conditions for various high-temperature processes such as diffusion and RTP. We look forward to becoming your long-term partner in China.

Vetek Semiconductor offers Porous SiC Ceramic Chuck widely used in wafer processing technology, transfer and other links, suitable for bonding, scribing, patch, polishing and other links, laser processing. Our Porous SiC Ceramic Chuck has Ultra-strong vacuum adsorption, high flatness and high purity meet the needs of most semiconductor industries.Welcome to inquiry us.