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SiC coating halfmoon graphite parts
  • SiC coating halfmoon graphite partsSiC coating halfmoon graphite parts
  • SiC coating halfmoon graphite partsSiC coating halfmoon graphite parts

SiC coating halfmoon graphite parts

As a professional semiconductor manufacturer and supplier, VeTek Semiconductor can provide a variety of graphite components required for SiC epitaxial growth systems. These SiC coating halfmoon graphite parts are designed for the gas inlet section of the epitaxial reactor and play a vital role in optimizing the semiconductor manufacturing process. VeTek Semiconductor always strives to provide customers with the best quality products at the most competitive prices. VeTek Semiconductor looks forward to becoming your long-term partner in China.

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Product Description

In the reaction chamber of the SiC epitaxial growth furnace, the SiC coating Halfmoon graphite parts are key components for optimizing gas flow distribution, thermal field control, and reaction atmosphere uniformity. They are usually made of SiC coating graphite,designed in a half-moon shape, located in the upper and lower graphite parts of the reaction chamber, surrounding the substrate area.



SiC epitaxial growth furnace schematic diagram

    • Upper halfmoon graphite part: installed in the upper part of the reaction chamber, near the gas inlet, responsible for guiding the reaction gas to flow toward the substrate surface.

    • Lower halfmoon graphite part: located at the bottom of the reaction chamber, usually below the substrate holder, used to control the gas flow direction and optimize the thermal field and gas distribution at the bottom of the substrate.


During the SiC epitaxy process, the upper half-moon graphite part helps guide the gas flow to be evenly distributed on the substrate, preventing the gas from directly impacting the substrate surface and causing local overheating or airflow turbulence. The lower half-moon graphite part allows the gas to flow smoothly through the substrate and then be discharged, while preventing turbulence from affecting the growth uniformity of the epitaxial layer.


In terms of thermal field regulation,SiC coating Halfmoon graphite parts help to evenly distribute the heat in the reaction chamber through shape and position. The upper halfmoon graphite part can effectively reflect the radiant heat of the heater to ensure the temperature above the substrate is stable. The lower half-moon graphite part also has a similar role, helping to evenly distribute the heat below the substrate through heat conduction to prevent excessive temperature differences.


The SiC coating makes the components resistant to high temperatures and thermally conductive, so VeTek Semiconductor’s halfmoon parts have a long service life. Carefully designed, our half-moon graphite parts for SiC epitaxy can be seamlessly integrated into many epitaxial reactors, helping to improve the overall efficiency and reliability of the semiconductor manufacturing process. Whatever your SiC coating Halfmoon graphite parts needs, please contact VeTek Semiconductor.


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