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    • China High Purity Graphite Sheet Manufacturer, Supplier, Factory

    As a professional High Purity Graphite Sheet manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable High Purity Graphite Sheet made in China, you can leave us a message.

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    • TaC Coating Heater

      TaC Coating Heater

      VeTek Semiconductor is a leading manufacturer and innovator of TaC Coating Heater in China. This product has an extremely high melting point (about 3880°C). The high melting point of TaC Coating Heater enables it to operate at extremely high temperatures, especially in the growth of gallium nitride (GaN) epitaxial layers in the metal organic chemical vapor deposition (MOCVD) process. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. We look forward to becoming your long-term partner in China.
    • CVD SiC Coated Barrel Susceptor

      CVD SiC Coated Barrel Susceptor

      VeTek Semiconductor is a leading manufacturer and innovator of CVD SiC Coated Barrel Susceptor in China. Our CVD SiC Coated Barrel Susceptor plays a key role in promoting the epitaxial growth of semiconductor materials on wafers with its excellent product characteristics. Welcome to your further consultation.
    • SiC Coated Support Ring

      SiC Coated Support Ring

      VeTek Semiconductor is a professional China manufacturer and supplier, mainly producing SiC coated support rings, CVD silicon carbide (SiC) coatings, tantalum carbide (TaC) coatings, bulk SiC, SiC powders and high-purity SiC materials. We are committed to providing perfect technical support and ultimate product solutions for the semiconductor industry, welcome to contact us.
    • Wafer Lift Pin

      Wafer Lift Pin

      VeTek Semiconductor is a leading EPI Wafer Lift Pin manufacturer and innovator in China.We have been specialized in SiC coating on surface of graphite for many years. We offer a EPI Wafer Lift Pin for Epi process. With high quality and competitive price,we welcome you to visit our factory in China.
    • Pull Silicon Single Crystal Jig

      Pull Silicon Single Crystal Jig

      VeTek Semiconductor’s Pull Silicon Single Crystal Jig are designed to ensure the purity of wafers and precise control of hot zones during crystallization, offering sustainable and efficient solutions for thephotovoltaic industry.Looking forward to setting long-term cooperation.
    • PECVD Graphite Boat

      PECVD Graphite Boat

      Vetek Semiconductor's PECVD graphite boat optimizes solar cell coating processes by spacing silicon wafers effectively and inducing glow discharge for uniform coating deposition. With advanced technology and material choices, Vetek semiconductor's PECVD graphite boats enhance silicon wafer quality and boost solar energy conversion efficiency.Pls no hesitate to inquiry us.
    • Related Blog
    • Reviews

    • Why is SiC coating a key core material for SiC epitaxial growth?

      This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

    • How thin can the Taiko process make silicon wafers?

      The Taiko process thins silicon wafers using its principles, technical advantages and process origins.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • What are the differences between MBE and MOCVD technologies?

      This article mainly discusses the respective process advantages and differences of Molecular Beam Epitaxy process and Metal-organic chemical vapour deposition technologies.

    • Silicon carbide nanomaterials

      Silicon carbide nanomaterials (SiC) are materials with at least one dimension at the nanometer scale (1-100nm). These materials can be zero-, one-, two-, or three-dimensional and have diverse applications.

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