China GaN thin Film Manufacturer, Supplier, Factory

We now have quite a few superb workers customers very good at marketing and advertising, QC, and working with forms of troublesome dilemma while in the creation approach for GaN thin Film,GaN Epitaxial Susceptor,GaN epitaxial growth process,Chemical vapor deposition (CVD),metal organic chemical vapor deposition (MOCVD), We aim at Ongoing system innovation, management innovation, elite innovation and market innovation, give full play to the overall advantages, and constantly improve service quality.
GaN thin Film, We welcome you to visit our company and factory. It is also convenient to visit our website. Our sales team will present you the best service. If you have to have more information, remember to feel free to contact us by E-mail or telephone. We have been sincerely hope to establish a good long-term business relationship with you through this opportunity, based on equal, mutual benefit from now till the future.

Hot Products

  • SiC Coated Barrel Susceptor for LPE PE2061S

    SiC Coated Barrel Susceptor for LPE PE2061S

    As one of the leading wafer susceptor manufacturing plants in China, VeTek Semiconductor has made continuous progress in wafer susceptor products and has become the first choice for many epitaxial wafer manufacturers. The SiC Coated Barrel Susceptor for LPE PE2061S provided by VeTek Semiconductor is designed for LPE PE2061S 4'' wafers. The susceptor has a durable silicon carbide coating that improves performance and durability during the LPE (liquid phase epitaxy) process. Welcome your inquiry, we look forward to becoming your long-term partner.
  • CVD SiC Coating Nozzle

    CVD SiC Coating Nozzle

    CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications. Welcome your further inquiry.
  • TaC Coated Ring for SiC Epitaxial Reactor

    TaC Coated Ring for SiC Epitaxial Reactor

    VeTek Semiconductor is a leading manufacturer and technology innovator of TaC Coated Ring for SiC Epitaxial Reactor in China, focusing on providing high-performance solutions for SiC epitaxial reactors. We have many years of experience in TaC coating technology. TaC Coated Ring has the characteristics of high purity, high stability, excellent corrosion resistance, etc., and can provide long-term stable performance in the harsh working environment of epitaxial reactors. We look forward to establishing a long-term strategic partnership with you.
  • Sapphire Crystal Growth rigid felt

    Sapphire Crystal Growth rigid felt

    As a large-scale factory and supplier of Sapphire Crystal Growth rigid felt products in China, VeTek Semiconductor Sapphire Crystal Growth rigid felt play an indispensable role in the operation of sapphire single crystal furnaces, spearheading critical functions throughout the entirety of the crystal growth process. By maintaining a stable furnace temperature, these components significantly reduce energy loss and enhance the quality of the growing crystals.
  • MOCVD SiC coating susceptor

    MOCVD SiC coating susceptor

    VeTek Semiconductor is a leading manufacturer and supplier of MOCVD SiC coating susceptors in China, focusing on the R&D and production of SiC coating products for many years. Our MOCVD SiC coating susceptors have excellent high temperature tolerance, good thermal conductivity, and low thermal expansion coefficient, playing a key role in supporting and heating silicon or silicon carbide (SiC) wafers and uniform gas deposition. Welcome to consult further.
  • Silicon Carbide Shower Head

    Silicon Carbide Shower Head

    VeTek Semiconductor is a leading manufacturer and supplier of Silicon Carbide Shower Head products in China. SiC Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation.

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