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    • China carbide ceramic Manufacturer, Supplier, Factory

    As a professional carbide ceramic manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable carbide ceramic made in China, you can leave us a message.

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    • CVD SiC Graphite Cylinder

      CVD SiC Graphite Cylinder

      Vetek Semiconductor’s CVD SiC Graphite Cylinder is pivotal in semiconductor equipment, serving as a protective shield within reactors to safeguard internal components in high temperature and pressure settings. It effectively shields against chemicals and extreme heat, preserving equipment integrity. With exceptional wear and corrosion resistance, it ensures longevity and stability in challenging environments. Utilizing these covers enhances semiconductor device performance, prolongs lifespan, and mitigates maintenance requirements and damage risks.Welcome to inquiry us.
    • Monocrystalline pulling Crucible

      Monocrystalline pulling Crucible

      Vetek Semiconductor recognizes the vital importance of Monocrystalline Pulling Crucibles in the process of achieving monocrystalline silicon ingot growth, a fundamental step in semiconductor device manufacturing. Our crucibles are intricately engineered to meet the rigorous requirements set by the semiconductor industry. Vetek Semiconductor is committed to producing and supplying crystal growth graphite crucibles that excel in performance, quality, and cost-effectiveness to meet the evolving needs of the industry.Welcome to inquiry us.
    • Contiguous Wafer Boat

      Contiguous Wafer Boat

      Vetek Semiconductor Contiguous Wafer Boat is an advanced equipment for semiconductor processing. The product structure of Contiguous Wafer Boat is carefully designed to ensure efficient processing and production of precision wafers. Vetek Semiconductor is committed to providing excellent technology and product solutions for the semiconductor industry. We look forward to becoming your long-term partner in China.
    • CVD TaC Coating Crucible

      CVD TaC Coating Crucible

      VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
    • TaC Coating Guide Rings

      TaC Coating Guide Rings

      As a leading manufacturer of TaC Coating Guide Rings products in China, VeTek Semiconductor TaC coated guide rings are important components in MOCVD equipment, ensuring accurate and stable gas delivery during epitaxial growth, and are an indispensable material in semiconductor epitaxial growth. Welcome to consult us.
    • SiC Coating Cover Segments

      SiC Coating Cover Segments

      Vetek Semiconductor is dedicated to the advancement and commercialization of CVD SiC coating and CVD TaC coating. As an illustration, our SiC Coating Cover Segments undergoes meticulous processing, resulting in a dense CVD SiC coating with exceptional precision. It exhibits remarkable resistance to high temperatures and offers robust protection against corrosion. We welcome your inquiries.
    • Related Blog
    • Reviews

    • Silicon carbide nanomaterials

      Silicon carbide nanomaterials (SiC) are materials with at least one dimension at the nanometer scale (1-100nm). These materials can be zero-, one-, two-, or three-dimensional and have diverse applications.

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • What is semiconductor epitaxy process?

      It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

    • Different technical routes of SiC epitaxial growth furnace

      Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

    • Principles and Technology of Physical Vapor Deposition (PVD) Coating (2/2) - VeTek Semiconductor

      Electron beam evaporation is a highly efficient and widely used coating method compared to resistance heating, which heats the evaporation material with an electron beam, causing it to vaporize and condense into a thin film.

    • Semiconductor substrate wafer: Material properties of silicon, GaAs, SiC and GaN

      The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

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