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    • China wafer handling tools Manufacturer, Supplier, Factory

    As a professional wafer handling tools manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable wafer handling tools made in China, you can leave us a message.

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    • Quartz Wafer Boat

      Quartz Wafer Boat

      As a professional quartz wafer boat manufacturer and supplier in China, Vetek Semiconductor Quartz Wafer Boat is designed to exceed industry standards and optimize your production process. Our quartz wafer boats are carefully designed and highly reliable to meet the stringent requirements of the semiconductor industry. Vetek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. We welcome your further inquiries.
    • SiC Coating Set Disc

      SiC Coating Set Disc

      VeTek Semiconductor, a leading manufacturer of CVD SiC coatings, offers SiC Coating Set Disc in Aixtron MOCVD Reactors. These SiC Coating Set Disc are crafted using high purity graphite and feature a CVD SiC coating with impurity below 5ppm. We welcome inquiries about this product.
    • 8 Inch Halfmoon Part for LPE Reactor

      8 Inch Halfmoon Part for LPE Reactor

      VeTek Semiconductor is a leading 8 Inch Halfmoon Part for LPE Reactor manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a 8 Inch Halfmoon Part for LPE Reactor designed specifically for LPE SiC epitaxy reactor. This halfmoon part a versatile and efficient solution for semiconductor manufacturing with its optimal size, compatibility, and high productivity.We welcome you to visit our factory in China.
    • Porous SiC Vacuum Chuck

      Porous SiC Vacuum Chuck

      As a professional Porous SiC Vacuum Chuck manufacturer and supplier in China, Vetek Semiconductor's Porous SiC Vacuum Chuck is widely used in key components of semiconductor manufacturing equipment, especially when it comes to CVD and PECVD processes. Vetek Semiconductor specializes in manufacturing and supplying high-performance Porous SiC Vacuum Chuck. Welcome your further inquiries.
    • SiC coating Monocrystalline silicon epitaxial tray

      SiC coating Monocrystalline silicon epitaxial tray

      SiC coating Monocrystalline silicon epitaxial tray is an important accessory for monocrystalline silicon epitaxial growth furnace, ensuring minimal pollution and stable epitaxial growth environment. VeTek Semiconductor's SiC coating Monocrystalline silicon epitaxial tray has an ultra-long service life and provides a variety of customization options. VeTek Semiconductor looks forward to becoming your long-term partner in China.
    • High purity Rigid felt tube

      High purity Rigid felt tube

      VeTek Semiconductor high purity rigid felt tubes are the first choice for high-temperature applications in the semiconductor industry. Their high compressive strength and excellent thermal insulation properties make them reliable and efficient components in the crystal growth process. VeTek Semiconductor has always been committed to providing advanced and reliable high-purity rigid felt tube technology and product solutions for the semiconductor industry. We welcome your further inquiries.
    • Related Blog
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    • What is the difference between CVD TaC and sintered TaC?

      This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • Why is SiC coating a key core material for SiC epitaxial growth?

      This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

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