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    • China Silicon carbide Wafer Manufacturer, Supplier, Factory

    As a professional Silicon carbide Wafer manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon carbide Wafer made in China, you can leave us a message.

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    • SiC Coating Wafer Carrier

      SiC Coating Wafer Carrier

      As a professional SiC coating wafer carrier manufacturer and supplier in China, Vetek Semiconductor's SiC coating wafer carriers are mainly used to improve the growth uniformity of epitaxial layer, ensuring their stability and integrity in high temperature and corrosive environments. Looking forward to your inquiry.
    • PECVD Graphite Boat

      PECVD Graphite Boat

      Vetek Semiconductor's PECVD graphite boat optimizes solar cell coating processes by spacing silicon wafers effectively and inducing glow discharge for uniform coating deposition. With advanced technology and material choices, Vetek semiconductor's PECVD graphite boats enhance silicon wafer quality and boost solar energy conversion efficiency.Pls no hesitate to inquiry us.
    • LPE Halfmoon SiC EPI Reactor

      LPE Halfmoon SiC EPI Reactor

      VeTek Semiconductor is a professional LPE Halfmoon SiC EPI Reactor product manufacturer, innovator and leader in China. LPE Halfmoon SiC EPI Reactor is a device specifically designed for producing high-quality silicon carbide (SiC) epitaxial layers, mainly used in the semiconductor industry. VeTek Semiconductor is committed to providing leading technology and product solutions for the semiconductor industry, and welcomes your further inquiries.
    • TaC Coating Heater

      TaC Coating Heater

      VeTek Semiconductor is a leading manufacturer and innovator of TaC Coating Heater in China. This product has an extremely high melting point (about 3880°C). The high melting point of TaC Coating Heater enables it to operate at extremely high temperatures, especially in the growth of gallium nitride (GaN) epitaxial layers in the metal organic chemical vapor deposition (MOCVD) process. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. We look forward to becoming your long-term partner in China.
    • Porous Tantalum Carbide

      Porous Tantalum Carbide

      VeTek Semiconductor is a professional manufacturer and leader of Porous Tantalum Carbide products in China. Porous Tantalum Carbide is usually manufactured by chemical vapor deposition (CVD) method, ensuring precise control of its pore size and distribution, and is a material tool dedicated to high temperature extreme environments. Welcome your further consultation.
    • Porous SiC Ceramic Chuck

      Porous SiC Ceramic Chuck

      Vetek Semiconductor offers Porous SiC Ceramic Chuck widely used in wafer processing technology, transfer and other links, suitable for bonding, scribing, patch, polishing and other links, laser processing. Our Porous SiC Ceramic Chuck has Ultra-strong vacuum adsorption, high flatness and high purity meet the needs of most semiconductor industries.Welcome to inquiry us.
    • Related Blog
    • Reviews

    • Material of silicon carbide epitaxy

      The material of silicon carbide epitaxial layer is silicon carbide, which is usually used to manufacture high-power electronic devices and LEDs. It is widely used in the semiconductor industry due to its excellent thermal stability, mechanical strength and high electrical conductivity.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

    • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

      SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

    • The Problems in the Etching Process

      Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

    • Chinese companies are reportedly developing 5nm chips with Broadcom!

      According to overseas news, two sources revealed on June 24 that ByteDance is working with US chip design company Broadcom to develop an advanced artificial intelligence (AI) computing processor, which will help ByteDance ensure an adequate supply of high-end chips amid tensions between China and the United States.

    • What is CVD TAC Coating?

      CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

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    High Pure Silicon Carbide Wafer CarrierSilicon Carbide Wafer BoatSilicon Carbide wafer CarrierSilicon Carbide Wafer ChuckSilicon Carbide wafer holdersilicon carbide wafer suppliers

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