English
Home > Products
  • Silicon Carbide wafer Carrier

    • China Silicon Carbide wafer Carrier Manufacturer, Supplier, Factory

    As a professional Silicon Carbide wafer Carrier manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon Carbide wafer Carrier made in China, you can leave us a message.

    Related Products

    Hot Products

    • Pyrolytic Graphite Coated Graphite Elements

      Pyrolytic Graphite Coated Graphite Elements

      VeTek Semiconductor is a leading supplier of customized Pyrolytic Graphite Coated graphite Elements in China, specializing in advanced materials for many years. Our Pyrolytic Carbon Coated Graphite Parts have dense surfaces and no pores. High purity, high temperature resistance, good chemical stability are the characristic of our PyC coating. Welcome to establish long-term cooperation with us.
    • High purity SiC wafer boat carrier

      High purity SiC wafer boat carrier

      VeTek Semiconductor offers customized High purity SiC wafer boat carrier. Made of high purity silicon carbide, it features slots to hold the wafer in place, preventing it from sliding during processing. CVD SiC coating is also available if required. As a professional and strong semiconductor manufacturer and supplier, VeTek Semiconductor's High purity SiC wafer boat carrier is price competitive and high quality. VeTek Semiconductor looks forward to being your long-term partner in China.
    • CVD SiC coating Epitaxy susceptor

      CVD SiC coating Epitaxy susceptor

      VeTek Semiconductor's CVD SiC Coating Epitaxy Susceptor is a precision-engineered tool designed for semiconductor wafer handling and processing. This SiC Coating Epitaxy Susceptor plays a vital role in promoting the growth of thin films, epilayers, and other coatings, and can precisely control temperature and material properties. Welcome your further inquiries.
    • TaC Coating Rotation Susceptor

      TaC Coating Rotation Susceptor

      As a professional manufacturer, innovator and leader of TaC Coating Rotation Susceptor products in China. VeTek Semiconductor TaC Coating Rotation Susceptor is usually installed in chemical vapor deposition (CVD) and molecular beam epitaxy (MBE) equipment to support and rotate wafers to ensure uniform material deposition and efficient reaction. It is a key component in semiconductor processing. Welcome your further consultation.
    • Vitreous Carbon Coated Graphite Crucible for E-beam Gun

      Vitreous Carbon Coated Graphite Crucible for E-beam Gun

      VeTek Semiconductor is a leading supplier of customized Vitreous Carbon Coated Graphite Crucible for E-beam Gun in China, specializing in advanced materials for many years. Our Vitreous Carbon Coated Graphite Crucible is specifically designed for E-beam Gun, ensuring excellent performance. Made from ultra-pure imported graphite, it offers reliability and durability. Visit our factory in China to explore deep cooperation.
    • SiC Coating graphite MOCVD heater

      SiC Coating graphite MOCVD heater

      VeTeK Semiconductor produces SiC Coating graphite MOCVD heater, which is a key component of the MOCVD process. Based on a high-purity graphite substrate, the surface is coated with a high-purity SiC coating to provide excellent high-temperature stability and corrosion resistance. With high quality and highly customized product services, VeTeK Semiconductor's SiC Coating graphite MOCVD heater is an ideal choice to ensure MOCVD process stability and thin film deposition quality. VeTeK Semiconductor looks forward to becoming your partner.
    • Related Blog
    • Reviews

    • Material of silicon carbide epitaxy

      The material of silicon carbide epitaxial layer is silicon carbide, which is usually used to manufacture high-power electronic devices and LEDs. It is widely used in the semiconductor industry due to its excellent thermal stability, mechanical strength and high electrical conductivity.

    • What is CVD TAC Coating?

      CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

    • A complete explanation of the chip manufacturing process (2/2): from wafer to packaging and testing

      Thin film deposition is vital in chip manufacturing, creating micro devices by depositing films under 1 micron thick via CVD, ALD, or PVD. These processes build semiconductor components through alternating conductive and insulating films.

    • Based on 8-inch silicon carbide single crystal growth furnace technology

      Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • Principles and Technology of Physical Vapor Deposition Coating (1/2) - VeTek Semiconductor

      Vacuum coating includes film material vaporization, vacuum transportation and thin film growth. According to the different film material vaporization methods and transportation processes, vacuum coating can be divided into two categories: PVD and CVD.

    Related Search

    High Pure Silicon Carbide Wafer Carrier

    Send Inquiry

    Hit enter to search or ESC to close
    X
    We use cookies to offer you a better browsing experience, analyze site traffic and personalize content. By using this site, you agree to our use of cookies. Privacy Policy
    Reject Accept