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  • SiC-Coated MOCVD Reactor Part

    • China SiC-Coated MOCVD Reactor Part Manufacturer, Supplier, Factory

    As a professional SiC-Coated MOCVD Reactor Part manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC-Coated MOCVD Reactor Part made in China, you can leave us a message.

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    • VEECO MOCVD Susceptor

      VEECO MOCVD Susceptor

      As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Welcome your further inquiries.
    • Wafer Handling End Effector

      Wafer Handling End Effector

      Vetek Semiconductor Wafer Handling End Effector is an important part in the semiconductor processing, transporting wafers and protecting their surfaces from damage. VeTek Semiconductor, as a leading manufacturer and supplier of Wafer Handling End Effector, is always committed to providing customers with excellent Wafer Handling Robotic Arm products and the best services. we look forward to becoming your long-term partner in wafer handling tools products.
    • SiN susbstrate

      SiN susbstrate

      VeTek Semiconductor is a leading manufacturer and supplier of SiN Substrates products in China. Our Silicon Nitride substrate has excellent thermal conductivity, excellent chemical stability and corrosion resistance, and excellent strength, making it a high-performance material for semiconductor applications. VeTekSemi SiN substrate ensures that you benefit from cutting-edge technology in the field of semiconductor processing, strict quality control, and welcomes your further consultation.
    • SiC Process Tube

      SiC Process Tube

      VeTek Semiconductor provides high-performance SiC Process Tubes for semiconductor manufacturing. Our SiC Process Tubes excel in oxidation, diffusion processes. With superior quality and craftsmanship, these tubes offer high-temperature stability and thermal conductivity for efficient semiconductor processing. We offer competitive pricing and seek to be your long-term partner in China.
    • High Purity SiC Cantilever Paddle

      High Purity SiC Cantilever Paddle

      VeTek Semiconductor is a leading manufacturer and innovator of High Purity SiC Cantilever Paddle in China. High Purity SiC Cantilever Paddles are commonly used in semiconductor diffusion furnaces as wafer transfer or loading platforms. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. We look forward to becoming your long-term partner in China.
    • CVD SiC Coated Skirt

      CVD SiC Coated Skirt

      VeTek Semiconductor is a leading manufacturer, innovator and leader of CVD SiC Coating and TAC Coating in China. For many years, we have been focusing on various CVD SiC Coating products such as CVD SiC coated Skirt, CVD SiC Coating Ring, CVD SiC Coating carrier, etc. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
    • Related Blog
    • Reviews

    • Why does SiC coating receive so much attention? - VeTek Semiconductor

      SiC has high hardness, thermal conductivity, and corrosion resistance, making it ideal for semiconductor manufacturing. CVD SiC coating is created through chemical vapor deposition, providing high thermal conductivity, chemical stability, and a matching lattice constant for epitaxial growth. Its low thermal expansion and high hardness ensure durability and precision, making it essential in applications like wafer carriers, preheating rings, and more. VeTek Semiconductor specializes in custom SiC coatings for diverse industry needs.

    • A complete explanation of the chip manufacturing process (2/2): from wafer to packaging and testing

      Thin film deposition is vital in chip manufacturing, creating micro devices by depositing films under 1 micron thick via CVD, ALD, or PVD. These processes build semiconductor components through alternating conductive and insulating films.

    • Do you know about MOCVD Susceptor?

      This article mainly introduces the product types, product characteristics and main functions of MOCVD Susceptor in semiconductor processing, and makes a comprehensive analysis and interpretation of MOCVD Susceptor products as a whole.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Principles and Technology of Physical Vapor Deposition Coating (1/2) - VeTek Semiconductor

      Vacuum coating includes film material vaporization, vacuum transportation and thin film growth. According to the different film material vaporization methods and transportation processes, vacuum coating can be divided into two categories: PVD and CVD.

    • Semiconductor substrate wafer: Material properties of silicon, GaAs, SiC and GaN

      The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

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