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  • SiC Coated Graphite Barrel Susceptor for EPI

    • China SiC Coated Graphite Barrel Susceptor for EPI Manufacturer, Supplier, Factory

    As a professional SiC Coated Graphite Barrel Susceptor for EPI manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC Coated Graphite Barrel Susceptor for EPI made in China, you can leave us a message.

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      8 Inch Halfmoon Part for LPE Reactor

      VeTek Semiconductor is a leading 8 Inch Halfmoon Part for LPE Reactor manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a 8 Inch Halfmoon Part for LPE Reactor designed specifically for LPE SiC epitaxy reactor. This halfmoon part a versatile and efficient solution for semiconductor manufacturing with its optimal size, compatibility, and high productivity.We welcome you to visit our factory in China.
    • Silicon On Insulator Wafer

      Silicon On Insulator Wafer

      VeTek Semiconductor is a professional Chinese manufacturer of Silicon On Insulator Wafer, ALD Planetary Base, and TaC Coated Graphite Base. VeTek Semiconductor's Silicon On Insulator Wafer is an important semiconductor substrate material, and its excellent product characteristics make it play a key role in high-performance, low-power, high-integration and RF applications. We look forward to further cooperation with you.
    • Quartz Wafer Boat

      Quartz Wafer Boat

      As a professional quartz wafer boat manufacturer and supplier in China, Vetek Semiconductor Quartz Wafer Boat is designed to exceed industry standards and optimize your production process. Our quartz wafer boats are carefully designed and highly reliable to meet the stringent requirements of the semiconductor industry. Vetek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. We welcome your further inquiries.
    • SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

      SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

      VeTek Semiconductor is a leading SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC-coated pancake susceptor designed specifically for LPE PE3061S 6” wafers. This epitaxial susceptor features high corrosion resistance, good heat conduction performance, good uniformity.We welcome you to visit our factory in China.
    • CVD TAC Coating

      CVD TAC Coating

      VeTek Semiconductor is a leading manufacturer, innovator and leader of CVD TAC Coating in China. For many years, we have been focusing on various CVD TAC Coating products such as CVD TaC coating cover, CVD TaC Coating Ring, CVD TaC Coating carrier, etc. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
    • TaC Coating Plate

      TaC Coating Plate

      VeTek Semiconductor's TaC Coating Plate is a remarkable product that offers exceptional features and advantages. Designed with precision and engineered to perfection, our TaC Coating Plate is specifically tailored for various applications in silicon carbide (SiC) single crystal growth processes.The TaC Coating Plate's precise dimensions and robust construction make it easy to integrate into existing systems, ensuring seamless compatibility and efficient operation. Its reliable performance and high-quality coating contribute to consistent and uniform results in SiC crystal growth applications.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
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      8-inch SiC epitaxial furnace and homoepitaxial process research

    • How to prepare CVD TaC coating?

      This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

      The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

    • Different technical routes of SiC epitaxial growth furnace

      Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

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