SiC coated wafer carrier

The Chip manufacturing is inseparable from wafers. In the wafer preparation process, there are two core links: one is the preparation of the substrate, and the other is the implementation of the epitaxial process. The substrate can be directly put into the wafer manufacturing process to produce semiconductor devices, or further enhanced through the epitaxial process. 

Epitaxy is to grow a new layer of single crystal on a single crystal substrate that has been finely processed (cutting, grinding, polishing, etc.). Because the newly grown single crystal layer will expand according to the crystal phase of the substrate, it is called an epitaxial layer. When the epitaxial layer grows on the substrate, the whole is called an epitaxial wafer. The introduction of epitaxial technology cleverly solves many defects of single substrates.

In the epitaxial growth furnace, the substrate cannot be placed randomly, and a wafer carrier is required to place the substrate on the wafer holder before epitaxial deposition can be performed on the substrate. This wafer holder is the SiC coated wafer carrier.

Cross-sectional view of the EPI reactor

A high-quality SiC coating is applied to the surface of SGL graphite using CVD technology:

With the help of SiC coating, many properties of SiC coated wafer holder have been significantly improved:

●  Antioxidant properties: SiC coating has good oxidation resistance and can protect the graphite matrix from oxidation at high temperatures and extend its service life.

●  High temperature resistance: The melting point of SiC coating is very high (about 2700°C). After adding SiC coating to graphite matrix, it can withstand higher temperatures, which is beneficial to application in epitaxial growth furnace environment.

●  Corrosion resistance: Graphite is prone to chemical corrosion in certain acidic or alkaline environments, while SiC coating has good resistance to acid and alkali corrosion, so it can be used in epitaxial growth furnaces for a long time.

●  Wear resistance: SiC material has high hardness. After graphite is coated with SiC, it is not easily damaged when used in an epitaxial growth furnace, reducing the material wear rate.

VeTek Semiconductor uses the best materials and the most advanced processing technology to provide customers with industry-leading SiC coated wafer carrier products. VeTek Semiconductor's strong technical team is always committed to tailoring the most suitable products and the best system solutions for customers.

SEM DATA OF CVD SIC FILM

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