LPE SI EPI Susceptor Set

VeTek Semiconductor is a professional China LPE Si EPI Susceptor Set manufacturer and supplier. With good quality and competitive price,welcome to visit our factory and set up long-term cooperation with us.

The VeTeK Semiconductor LPE Si Epi Susceptor Set is a high-performance product created by applying a fine layer of silicon carbide onto the surface of highly purified isotropic graphite. This is achieved through VeTeK Semiconductor's proprietary Chemical Vapor Deposition (CVD) process.

VeTek Semiconductor's LPE Si Epi Susceptor Set is a CVD epitaxial deposition barrel reactor designed to perform reliably even in challenging conditions. Its outstanding coating adhesion, resistance to high-temperature oxidation, and corrosion make it an ideal choice for harsh environments. Moreover, its uniform thermal profile and laminar gas flow pattern prevent contamination, ensuring the growth of high-quality epitaxial layers.

The barrel-shaped design of our semiconductor epitaxial reactor optimizes the flow of gas, ensuring that heat is evenly distributed. This feature effectively prevents contamination and the diffusion of impurities, guaranteeing the production of high-quality epitaxial layers on wafer substrates.

At VeTek Semiconductor, we are committed to providing customers with high-quality and cost-effective products. Our LPE Si Epi Susceptor Set offers competitive pricing while maintaining excellent density for both the graphite substrate and silicon carbide coating. This combination ensures reliable protection in high-temperature and corrosive working environments.

SEM DATA OF CVD SIC FILM