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    • China Inlet Rings Manufacturer, Supplier, Factory

    As a professional Inlet Rings manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Inlet Rings made in China, you can leave us a message.

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    • CVD SiC Coating Baffle

      CVD SiC Coating Baffle

      Vetek Semiconductor's CVD SiC Coating Baffle is mainly used in Si Epitaxy. It is usually used with silicon extension barrels. It combines the unique high temperature and stability of the CVD SiC Coating Baffle, which greatly improves the uniform distribution of airflow in semiconductor manufacturing. We believe that our products can bring you Advanced Technology and High-Quality Product Solutions.
    • SiC Coating Epi susceptor

      SiC Coating Epi susceptor

      VeTek Semiconductor is a leading manufacturer, innovator and leader of SiC Coating Epi Susceptor products in China. For many years, we have been focusing on various SiC Coating products such as SiC Coating Epi Susceptor, SiC Coating Wafer Carrier, SiC Coating Susceptor, SiC coating ALD susceptor, etc. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. Welcome your further consultation.
    • Tantalum Carbide Coating Cover

      Tantalum Carbide Coating Cover

      VeTek Semiconductor is a leading manufacturer and innovator of Tantalum Carbide Coating Cover in China. We focus on providing high-purity, high-temperature resistant tantalum carbide products. Our tantalum carbide coated cover have excellent performance and reliability, and can effectively protect materials in extremely high temperature and corrosive environments. We look forward to becoming your long-term partner in China.
    • TaC Coated Deflector Ring

      TaC Coated Deflector Ring

      VeTek Semiconductor's TaC Coated Deflector Ring is a highly specialized component designed for SiC crystal growth processes. The TaC coating provides excellent high temperature resistance and chemical inertness to cope with the high temperatures and corrosive environments during crystal growth process. This ensures stable performance and long life of the component, reducing the frequency of replacement and downtime. We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
    • SiC Process Tube

      SiC Process Tube

      VeTek Semiconductor provides high-performance SiC Process Tubes for semiconductor manufacturing. Our SiC Process Tubes excel in oxidation, diffusion processes. With superior quality and craftsmanship, these tubes offer high-temperature stability and thermal conductivity for efficient semiconductor processing. We offer competitive pricing and seek to be your long-term partner in China.
    • Contiguous Wafer Boat

      Contiguous Wafer Boat

      Vetek Semiconductor Contiguous Wafer Boat is an advanced equipment for semiconductor processing. The product structure of Contiguous Wafer Boat is carefully designed to ensure efficient processing and production of precision wafers. Vetek Semiconductor is committed to providing excellent technology and product solutions for the semiconductor industry. We look forward to becoming your long-term partner in China.
    • Related Blog
    • Reviews

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • Why is SiC coating a key core material for SiC epitaxial growth?

      This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

    • How to prepare CVD TaC coating?

      This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

    • Different technical routes of SiC epitaxial growth furnace

      Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

    • A complete explanation of the chip manufacturing process (2/2): from wafer to packaging and testing

      Thin film deposition is vital in chip manufacturing, creating micro devices by depositing films under 1 micron thick via CVD, ALD, or PVD. These processes build semiconductor components through alternating conductive and insulating films.

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