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China GaN Epitaxy Manufacturer, Supplier, Factory

To be a result of ours specialty and repair consciousness, our corporation has won a good popularity amid consumers everywhere in the environment for GaN Epitaxy,GaN Epitaxy susceptor,GaN on SiC epi susceptor,GaN Epitaxial Graphite Susceptor for G5,Silicon-based GaN Epitaxial Susceptor, We welcome an prospect to do small business along with you and hope to have pleasure in attaching further particulars of our merchandise.
GaN Epitaxy, Strong infrastructure is the require of any organization. We have been backed with a robust infrastructural facility that enables us to manufacture, store, quality check and dispatch our merchandise worldwide. To maintain smooth work flow, we have now sectioned our infrastructure into a number of departments. All these departments are functional with latest tools, modernized machines and equipment. Owing to which, we're able to accomplish voluminous production without compromising upon the quality.

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  • SiC Coated Barrel Susceptor

    SiC Coated Barrel Susceptor

    Epitaxy is a technique used in semiconductor device manufacturing to grow new crystals on an existing chip to make a new semiconductor layer.VeTek Semiconductor offers a comprehensive set of component solutions for LPE silicon epitaxy reaction chambers, delivering long lifespan, stable quality, and improved epitaxial layer yield. Our product such as SiC Coated Barrel Susceptor received position feedback from customers. We also provide technical support for Si Epi, SiC Epi, MOCVD, UV-LED Epitaxy, and more. Feel free to inquire for pricing information.
  • High purity Rigid felt tube

    High purity Rigid felt tube

    VeTek Semiconductor high purity rigid felt tubes are the first choice for high-temperature applications in the semiconductor industry. Their high compressive strength and excellent thermal insulation properties make them reliable and efficient components in the crystal growth process. VeTek Semiconductor has always been committed to providing advanced and reliable high-purity rigid felt tube technology and product solutions for the semiconductor industry. We welcome your further inquiries.
  • CVD SiC coating barrel susceptor

    CVD SiC coating barrel susceptor

    VeTek Semiconductor CVD SiC coating barrel susceptor is the core component of the barrel type epitaxial furnace.With the help of CVD SiC coating barrel susceptor, the quantity and quality of epitaxial growth are greatly improved.VeTek Semiconductor is a professional manufacturer and supplier of SiC Coated Barrel Susceptor, and is at the leading level in China and even in the world.VeTek Semiconductor looks forward to establishing a close cooperative relationship with you in the semiconductor industry.
  • VEECO MOCVD Susceptor

    VEECO MOCVD Susceptor

    As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Welcome your further inquiries.
  • Silicon-based GaN Epitaxial Susceptor

    Silicon-based GaN Epitaxial Susceptor

    Silicon-based GaN Epitaxial Susceptor is the core component required for GaN Epitaxial production. VeTek Semiconductor, as a professional manufacturer and supplier, is committed to providing high-quality Silicon-based GaN Epitaxial Susceptor. Our Silicon-based GaN Epitaxial Susceptor is designed for Silicon-based GaN Epitaxial reactor systems and features high purity, excellent high temperature resistance, and corrosion resistance. VeTek Semiconductor is committed to providing quality products at competitive prices, welcome to inquire.
  • TaC Coated Ring for SiC Epitaxial Reactor

    TaC Coated Ring for SiC Epitaxial Reactor

    VeTek Semiconductor is a leading manufacturer and technology innovator of TaC Coated Ring for SiC Epitaxial Reactor in China, focusing on providing high-performance solutions for SiC epitaxial reactors. We have many years of experience in TaC coating technology. TaC Coated Ring has the characteristics of high purity, high stability, excellent corrosion resistance, etc., and can provide long-term stable performance in the harsh working environment of epitaxial reactors. We look forward to establishing a long-term strategic partnership with you.
  • Related Blog
  • Reviews

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

  • What is hot pressed SiC ceramics?

    Hot pressing sintering is the main method for preparing high-performance SiC ceramics. The process of hot pressing sintering includes: selecting high-purity SiC powder, pressing and molding under high temperature and high pressure, and then sintering. SiC ceramics prepared by this method have the advantages of high purity and high density, and are widely used in grinding discs and heat treatment equipment for wafer processing.

  • Why does SiC coating receive so much attention? - VeTek Semiconductor

    SiC has high hardness, thermal conductivity, and corrosion resistance, making it ideal for semiconductor manufacturing. CVD SiC coating is created through chemical vapor deposition, providing high thermal conductivity, chemical stability, and a matching lattice constant for epitaxial growth. Its low thermal expansion and high hardness ensure durability and precision, making it essential in applications like wafer carriers, preheating rings, and more. VeTek Semiconductor specializes in custom SiC coatings for diverse industry needs.

  • Thermal Field Design for SiC Single Crystal Growth

    With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

  • Why is tantalum carbide (TaC) coating superior to silicon carbide (SiC) coating in SiC single crystal growth? - VeTek semiconductor

    From the application perspective of SiC single crystal growth, this article compares the basic physical parameters of TaC coating and SIC coating, and explains the basic advantages of TaC coating over SiC coating in terms of high temperature resistance, strong chemical stability, reduced impurities, and lower costs.

  • What is the difference between silicon carbide (SiC) and gallium nitride (GaN) applications? - VeTek Semiconductor

    SiC and GaN are wide bandgap semiconductors with advantages over silicon, such as higher breakdown voltages, faster switching speeds, and superior efficiency. SiC is better for high-voltage, high-power applications due to its higher thermal conductivity, while GaN excels in high-frequency applications thanks to its superior electron mobility.

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GaN Epitaxy susceptorGaN Epitaxy waferMOCVD GaN EpitaxySilicon-base GaN epitaxyVEECO GaN Epitaxy

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