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    • China GaN Epitaxy Manufacturer, Supplier, Factory

    As a professional GaN Epitaxy manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable GaN Epitaxy made in China, you can leave us a message.

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      Tantalum Carbide Coating Cover

      VeTek Semiconductor is a leading manufacturer and innovator of Tantalum Carbide Coating Cover in China. We focus on providing high-purity, high-temperature resistant tantalum carbide products. Our tantalum carbide coated cover have excellent performance and reliability, and can effectively protect materials in extremely high temperature and corrosive environments. We look forward to becoming your long-term partner in China.
    • TaC Coated ring

      TaC Coated ring

      As a leading manufacturer and supplier of TaC Coated ring products in China, VeTek Semiconductor has been focusing on the R&D and production of various TaC coating products. As the main customers of TaC Coating products, European and American manufacturers have given high praise to our coating products. Welcome to your further consultation.
    • CVD SiC coating barrel susceptor

      CVD SiC coating barrel susceptor

      VeTek Semiconductor CVD SiC coating barrel susceptor is the core component of the barrel type epitaxial furnace.With the help of CVD SiC coating barrel susceptor, the quantity and quality of epitaxial growth are greatly improved.VeTek Semiconductor is a professional manufacturer and supplier of SiC Coated Barrel Susceptor, and is at the leading level in China and even in the world.VeTek Semiconductor looks forward to establishing a close cooperative relationship with you in the semiconductor industry.
    • Silicon Carbide Epitaxy Wafer Carrier

      Silicon Carbide Epitaxy Wafer Carrier

      VeTek Semiconductor is a leading customized Silicon Carbide Epitaxy Wafer Carrier supplier in China.We have been specialized in advanced material more than 20 years.We offer a Silicon Carbide Epitaxy Wafer Carrier for carrying SiC substrate, growing SiC epitaxy layer in SiC epitaxial reactor. This Silicon Carbide Epitaxy Wafer Carrier is an important SiC coated part of halfmoon part, high temperature resistance, oxidation resistance, wear resistance. We welcome you to visit our factory in China.
    • TaC Coating Planetary Susceptor

      TaC Coating Planetary Susceptor

      VeTek Semiconductor'TaC Coating Planetary Susceptor is an exceptional product for Aixtron epitaxy equipment. The robust TaC coating provides excellent high-temperature resistance and chemical inertness. This unique combination ensures reliable performance and long service life, even in demanding environments. VeTek is committed to providing high-quality products and serving as a long-term partner in the Chinese market with competitive pricing.
    • silicon carbide ceramic coating heater

      silicon carbide ceramic coating heater

      VeTek Semiconductor is a professional silicon carbide ceramic coating heater manufacturer in China. The silicon carbide ceramic coating heater is mainly designed for the high temperature and harsh environment of semiconductor manufacturing. Its ultra-high melting point, excellent corrosion resistance and outstanding thermal conductivity determine the indispensability of this product in the semiconductor production process. We sincerely hope to establish a long-term business relationship with you.
    • Related Blog
    • Reviews

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • Semiconductor process: Chemical Vapor Deposition (CVD)

      Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

    • Roll up! Two major manufacturers are about to mass produce 8-inch silicon carbide

      As the 8-inch silicon carbide (SiC) process matures, manufacturers are accelerating the shift from 6-inch to 8-inch. Recently, ON Semiconductor and Resonac announced updates on 8-inch SiC production.

    • The Development History of 3C SiC

      Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • Semiconductor substrate wafer: Material properties of silicon, GaAs, SiC and GaN

      The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

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