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China CVD SIC FILM Manufacturer, Supplier, Factory

As a professional CVD SIC FILM manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable CVD SIC FILM made in China, you can leave us a message.

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  • SiC Coated Top Plate for LPE PE2061S

    SiC Coated Top Plate for LPE PE2061S

    VeTek Semiconductor is a leading SiC Coated Top Plate for LPE PE2061S manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC Coated Top Plate for LPE PE2061S designed specifically for LPE silicon epitaxy reactor. This SiC Coated Top Plate for LPE PE2061S is the top together with barrel susceptor.This CVD SiC coated plate boasts high purity, excellent thermal stability, and uniformity, making it suitable for growing high-quality epitaxial layers.We welcome you to visit our factory in China.
  • TaC Coated Ring for SiC Epitaxial Reactor

    TaC Coated Ring for SiC Epitaxial Reactor

    VeTek Semiconductor is a large-scale TaC Coated Ring for SiC Epitaxial Reactor manufacturer and innovator in China.We have been specialized in TaC coating for many years.Our products have high purity, high stability, excellent corrosion resistance, high bond strength.We look forward to becoming your long-term partner in China.
  • CVD SiC Coated Ceiling

    CVD SiC Coated Ceiling

    As a professional CVD SiC coated ceiling manufacturer and supplier in China, VeTek Semiconductor's CVD SiC coated ceiling has excellent properties such as high temperature resistance, corrosion resistance, high hardness, and low thermal expansion coefficient, making it an ideal material choice in semiconductor manufacturing. We look forward to further cooperation with you.
  • SiC coated Wafer Holder

    SiC coated Wafer Holder

    VeTek Semiconductor is a professional manufacturer and leader of SiC coated wafer holder products in China. SiC coated wafer holder is a wafer holder for the epitaxy process in semiconductor processing. It is an irreplaceable device that stabilizes the wafer and ensures the uniform growth of the epitaxial layer. Welcome your further consultation.
  • Porous Graphite

    Porous Graphite

    VeTek Semiconductor is a professional manufacturer of Porous Graphite, CVD SiC coating, and CVD TAC COATING graphite susceptor in China. In fact, as a core consumable in the semiconductor manufacturing process, Porous Graphite plays an irreplaceable role in multiple links such as crystal growth, doping, and annealing. VeTek Semiconductor is committed to providing high-quality products at competitive prices, and we look forward to becoming your long-term partner in China.
  • Silicon Carbide Epitaxy Wafer Carrier

    Silicon Carbide Epitaxy Wafer Carrier

    VeTek Semiconductor is a leading customized Silicon Carbide Epitaxy Wafer Carrier supplier in China.We have been specialized in advanced material more than 20 years.We offer a Silicon Carbide Epitaxy Wafer Carrier for carrying SiC substrate, growing SiC epitaxy layer in SiC epitaxial reactor. This Silicon Carbide Epitaxy Wafer Carrier is an important SiC coated part of halfmoon part, high temperature resistance, oxidation resistance, wear resistance. We welcome you to visit our factory in China.
  • Related Blog
  • Reviews

  • What is TaC Coating ? - VeTek Semiconductor

    This article mainly introduces the product types, product characteristics and main functions of TaC Coating in semiconductor processing, and makes a comprehensive analysis and interpretation of TaC Coating products as a whole.

  • Thermal Field Design for SiC Single Crystal Growth

    With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

  • What challenges does the CVD TaC coating process for SiC single crystal growth face in semiconductor processing?

    The article analyzes the specific challenges faced by the CVD TaC coating process for SiC single crystal growth during semiconductor processing, such as material source and purity control, process parameter optimization, coating adhesion, equipment maintenance and process stability, environmental protection and cost control, as well as the corresponding industry solutions.

  • What is semiconductor epitaxy process?

    It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

  • Characteristics of silicon epitaxy

    High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

  • Based on 8-inch silicon carbide single crystal growth furnace technology

    Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

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