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As a professional Aixtron equipment manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Aixtron equipment made in China, you can leave us a message.

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  • TaC Coating Guide Rings

    TaC Coating Guide Rings

    As a leading manufacturer of TaC Coating Guide Rings products in China, VeTek Semiconductor TaC coated guide rings are important components in MOCVD equipment, ensuring accurate and stable gas delivery during epitaxial growth, and are an indispensable material in semiconductor epitaxial growth. Welcome to consult us.
  • Porous Graphite

    Porous Graphite

    VeTek Semiconductor is a professional manufacturer of Porous Graphite, CVD SiC coating, and CVD TAC COATING graphite susceptor in China. In fact, as a core consumable in the semiconductor manufacturing process, Porous Graphite plays an irreplaceable role in multiple links such as crystal growth, doping, and annealing. VeTek Semiconductor is committed to providing high-quality products at competitive prices, and we look forward to becoming your long-term partner in China.
  • MOCVD Susceptor with TaC Coating

    MOCVD Susceptor with TaC Coating

    VeTek Semiconductor is a comprehensive supplier involved in the research, development, production, design, and sales of TaC coatings and SiC coating parts. Our expertise lies in the production of state-of-the-art MOCVD Susceptor with TaC Coating, which play a vital role in the LED epitaxy process. We welcome you to discuss with us inquiries and further information.
  • MOCVD Epitaxial Susceptor for 4

    MOCVD Epitaxial Susceptor for 4" Wafer

    VeTek Semiconductor is a professional manufacturer and supplier, who is dedicated to providing high-quality MOCVD Epitaxial Susceptor for 4" Wafer. with rich industry experience and a professional team, we are able to deliver expert and efficient solutions to our clients.
  • CVD TaC Coating Crucible

    CVD TaC Coating Crucible

    VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
  • SiC Wafer Boat

    SiC Wafer Boat

    VeTek Semiconductor's SiC Wafer Boat is a very high performance product. Our SiC Wafer Boat is usually used in semiconductor oxidation diffusion furnaces to ensure that the temperature is evenly distributed on the wafer and improve the silicon wafer processing quality. The high temperature stability and high thermal conductivity of SiC materials ensure efficient and reliable semiconductor processing. We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
  • Related Blog
  • Reviews

  • Principles and Technology of Physical Vapor Deposition (PVD) Coating (2/2) - VeTek Semiconductor

    Electron beam evaporation is a highly efficient and widely used coating method compared to resistance heating, which heats the evaporation material with an electron beam, causing it to vaporize and condense into a thin film.

  • GaN-based low-temperature epitaxy technology

    This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

  • What is CVD TAC Coating? - Veteksemi

    CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

  • Chip manufacturing: A process flow of MOSFET

    The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

  • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

    In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

  • Silicon(Si) epitaxy preparation technology

    Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

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