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    • China VeTekSemi Wafer Lift Pin Manufacturer, Supplier, Factory

    As a professional VeTekSemi Wafer Lift Pin manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable VeTekSemi Wafer Lift Pin made in China, you can leave us a message.

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    • ALD Susceptor

      ALD Susceptor

      VeTek Semiconductor is a professional manufacturer of ALD Susceptor, CVD SiC coating, CVD TAC COATING graphite base in China. Vetek Semiconductor jointly developed and produced SiC-coated ALD planetary bases with ALD system manufacturers to meet the high requirements of the ALD process and evenly distribute the air flow on the substrate. We look forward to further cooperation with you.
    • CVD SiC Coated Barrel Susceptor

      CVD SiC Coated Barrel Susceptor

      VeTek Semiconductor is a leading manufacturer and innovator of CVD SiC Coated Barrel Susceptor in China. Our CVD SiC Coated Barrel Susceptor plays a key role in promoting the epitaxial growth of semiconductor materials on wafers with its excellent product characteristics. Welcome to your further consultation.
    • PyC Coating Rigid Felt Ring

      PyC Coating Rigid Felt Ring

      VeTek Semiconductor is a leading manufacturer of customized PyC Coating Rigid Felt Ring in China, specializing in advanced materials for many years. Our PyC Coating Rigid Felt Ring have dense surface and high purity. With 2 laboratories and 12 production lines, thousand-grade and hundred-grade production workshops in our factory, welcome to visit us.
    • MOCVD SiC coating susceptor

      MOCVD SiC coating susceptor

      VeTek Semiconductor is a leading manufacturer and supplier of MOCVD SiC coating susceptors in China, focusing on the R&D and production of SiC coating products for many years. Our MOCVD SiC coating susceptors have excellent high temperature tolerance, good thermal conductivity, and low thermal expansion coefficient, playing a key role in supporting and heating silicon or silicon carbide (SiC) wafers and uniform gas deposition. Welcome to consult further.
    • Physical Vapor Deposition

      Physical Vapor Deposition

      Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
    • Advanced Porous Graphite

      Advanced Porous Graphite

      As a professional and powerful manufacturer and supplier, Vetek Semiconductor has always been committed to providing High-purity Advanced Porous Graphite to the market. Relying on our own professional and excellent team, we are able to provide our customers with tailor-made products with competitive prices and efficient solutions.Vetek Semiconductor sincerely look forward to becoming your partner in China.
    • Related Blog
    • Reviews

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • Why does SiC coated Graphite Susceptor fail? - VeTek Semiconductor

      During the SiC epitaxial growth process, SiC coated graphite suspension failure may occur. This paper conducts a rigorous analysis of the failure phenomenon of SiC coated graphite suspension, which mainly includes two factors: SiC epitaxial gas failure and SiC coating failure.

    • Characteristics of silicon epitaxy

      High purity: The silicon epitaxial layer grown by chemical vapor deposition (CVD) has extremely high purity, better surface flatness and lower defect density than traditional wafers.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • Uses of solid silicon carbide

      Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

    • What is the difference between CVD TaC and sintered TaC?

      This article first introduces the molecular structure and physical properties of TaC, and focuses on the differences and applications of sintered tantalum carbide and CVD tantalum carbide, as well as VeTek Semiconductor's popular TaC coating products.

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