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    • China vacuum sealing Part Manufacturer, Supplier, Factory

    As a professional vacuum sealing Part manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable vacuum sealing Part made in China, you can leave us a message.

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    • silicon carbide ceramic coating heater

      silicon carbide ceramic coating heater

      VeTek Semiconductor is a professional silicon carbide ceramic coating heater manufacturer in China. The silicon carbide ceramic coating heater is mainly designed for the high temperature and harsh environment of semiconductor manufacturing. Its ultra-high melting point, excellent corrosion resistance and outstanding thermal conductivity determine the indispensability of this product in the semiconductor production process. We sincerely hope to establish a long-term business relationship with you.
    • SiN substrate

      SiN substrate

      VeTek Semiconductor is a leading manufacturer and supplier of SiN Substrate products in China. Our Silicon Nitride substrate has excellent thermal conductivity, excellent chemical stability and corrosion resistance, and excellent strength, making it a high-performance material for semiconductor applications. VeTekSemi SiN substrate ensures that you benefit from cutting-edge technology in the field of semiconductor processing, strict quality control, and welcomes your further consultation.
    • VEECO MOCVD Susceptor

      VEECO MOCVD Susceptor

      As a leading manufacturer and supplier of VEECO MOCVD Susceptor products in China, VeTek Semiconductor's MOCVD Susceptor represents the pinnacle of innovation and engineering excellence, specially customized to meet the complex requirements of contemporary semiconductor manufacturing processes. Welcome your further inquiries.
    • Silicon Carbide wafer Carrier

      Silicon Carbide wafer Carrier

      As a professional Silicon Carbide wafer carrier supplier in China, VeTek Semiconductor SiC wafer carrier is a tool specially used for handling and processing semiconductor wafers, which plays an irreplaceable role in the semiconductor wafer process. Welcome to your further consultation.
    • CVD TaC Coating Crucible

      CVD TaC Coating Crucible

      VeTek Semiconductor is a professional manufacturer and leader of CVD TaC Coating Crucible products in China. CVD TaC Coating Crucible is based on tantalum carbon (TaC) coating. The tantalum carbon coating is evenly covered on the surface of the crucible through chemical vapor deposition (CVD) process to enhance its heat resistance and corrosion resistance. It is a material tool specially used in high temperature extreme environments. Welcome your further consultation.
    • SiC Coating Collector Bottom

      SiC Coating Collector Bottom

      With our expertise in CVD SiC coating manufacturing, VeTek Semiconductor proudly presents Aixtron SiC Coating Collector Bottom. These SiC Coating Collector Bottom is constructed using high purity graphite and are coated with CVD SiC, ensuring impurity below 5ppm. Feel free to reach out to us for further information and inquiries.
    • Related Blog
    • Reviews

    • A complete explanation of the chip manufacturing process (2/2): from wafer to packaging and testing

      Thin film deposition is vital in chip manufacturing, creating micro devices by depositing films under 1 micron thick via CVD, ALD, or PVD. These processes build semiconductor components through alternating conductive and insulating films.

    • Chip manufacturing: A process flow of MOSFET

      The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

    • What is CVD TAC Coating?

      CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

    • ALD Atomic Layer Deposition Recipe

      Spatial ALD, spatially isolated atomic layer deposition. The wafer moves between different positions and is exposed to different precursors at each position. The figure below is a comparison between traditional ALD and spatially isolated ALD.

    • Based on 8-inch silicon carbide single crystal growth furnace technology

      Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

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