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    • China SIC WAFER BOAT Manufacturer, Supplier, Factory

    As a professional SIC WAFER BOAT manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SIC WAFER BOAT made in China, you can leave us a message.

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    • CVD SiC Coating Wafer Epi Susceptor

      CVD SiC Coating Wafer Epi Susceptor

      VeTek Semiconductor CVD SiC coating wafer Epi susceptor is an indispensable component for SiC epitaxy growth, offering superior thermal management, chemical resistance, and dimensional stability. By choosing VeTek Semiconductor's CVD SiC coating wafer Epi susceptor, you enhance the performance of your MOCVD processes, leading to higher quality products and greater efficiency in your semiconductor manufacturing operations. Welcome your further inquiries.
    • CVD TaC Coating Cover

      CVD TaC Coating Cover

      CVD TaC coating cover provided by VeTek Semiconductor is a highly specialized component designed specifically for demanding applications. With its advanced features and exceptional performance, our CVD TaC coating cover offers several key advantages.Our CVD TaC coating cover provides the necessary protection and performance required for success.We looking forward to exploring potential cooperation with you!
    • LED EPI Susceptor

      LED EPI Susceptor

      VeTek Semiconductor is a leading supplier of TaC coatings and SiC coating graphite parts. We specialize in the production of cutting-edge LED EPI Susceptors, essential for LED epitaxy processes. With a strong focus on innovation and quality, we offer reliable solutions that meet the stringent requirements of the LED industry. Contact us today to discuss your inquiries and discover how our products can enhance your manufacturing processes.
    • TaC Coating Tube

      TaC Coating Tube

      As a professional TaC Coating Tube manufacturer and supplier in China, VeTek Semiconductor's TaC coating tube is a key component for the successful growth of silicon carbide single crystals. With its high temperature resistance, chemical inertness and excellent performance, it ensures the production of high-quality crystals with consistent results. Trust our innovative solutions to enhance your PVT method SiC crystal growth process and achieve excellent results.Welcome to inquiry us.
    • Tantalum Carbide Ring

      Tantalum Carbide Ring

      As an advanced manufacturer and producer of Tantalum Carbide Ring products in China, VeTek Semiconductor Tantalum Carbide Ring has extremely high hardness, wear resistance, high temperature resistance and chemical stability, and is widely used in the semiconductor manufacturing field. Especially in CVD, PVD, ion implantation process, etching process, and wafer processing and transportation, it is an indispensable product for semiconductor processing and manufacturing. Looking forward to your further consultation.
    • Ceramic Electrostatic Chuck

      Ceramic Electrostatic Chuck

      Ceramic Electrostatic Chuck is widely used in semiconductor manufacturing and processing to fix wafers. It is an indispensable tool for high-precision wafer processing. VeTek Semiconductor is an experienced manufacturer and supplier of Ceramic Electrostatic Chuck, and can provide highly customized products according to different customer needs.
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    • What is TaC Coating ?

      This article mainly introduces the product types, product characteristics and main functions of TaC Coating in semiconductor processing, and makes a comprehensive analysis and interpretation of TaC Coating products as a whole.

    • Based on 8-inch silicon carbide single crystal growth furnace technology

      Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

    • Chip manufacturing: A process flow of MOSFET

      The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

    • 8-inch SiC epitaxial furnace and homoepitaxial process research

      8-inch SiC epitaxial furnace and homoepitaxial process research

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

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