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As a professional sic tubes manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable sic tubes made in China, you can leave us a message.

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  • Glassy Carbon Coated Graphite Crucible

    Glassy Carbon Coated Graphite Crucible

    VeTek Semiconductor is a leading supplier of customized Glassy Carbon Coated Graphite Crucible in China, specializing in glassy carbon materials for many years.Our Glassy Carbon Coated Graphite Crucible is meticulously engineered to deliver exceptional performance specifically for E-beam Guns, silicon single crystal pulling, epitaxy. It offers enhanced durability against scratching and other friction, also reduces the generation of dust.Welcome to visit us.
  • Graphite Heating Unit

    Graphite Heating Unit

    VeTek Semiconductor Graphite Heating Unit is a high-performance industrial heating solution made of high-purity graphite material, which can provide precise and efficient heating effect. Graphite Heating Unit is widely used in semiconductor, electronics, ceramics and other fields. Welcome your further inquiry.
  • SiC Coated Graphite Crucible Deflector

    SiC Coated Graphite Crucible Deflector

    VeTek Semiconductor have many years of experience in production of high quality SiC coated graphite crucible deflector. We have own laboratory for material research and development, can support your custom designs with superior quality. we welcome you to visit our factory for more discussion.
  • 4H N-type SiC Substrate

    4H N-type SiC Substrate

    As a professional 4H N-type SiC Substrate manufacturer and supplier in China, Vetek Semiconductor 4H N-type SiC Substrate aims to provide advanced technology and product solutions for the semiconductor industry. Our 4H N-type SiC Wafer is carefully designed and manufactured with high reliability to meet the demanding requirements of the semiconductor industry. We welcome your further inquiries.
  • Quartz crucible

    Quartz crucible

    VeTek Semiconductor is a leading quartz crucible supplier and manufacturer in China. the quartz crucibles we produce are mainly used in the semiconductor and photovoltaic fields. They have the properties of cleanliness and high temperature resistance. And our quartz crucible for semiconductor support the production processes of silicon rod pulling, loading and unloading of polysilicon raw materials in the semiconductor silicon wafer production process, and are key consumables for silicon wafer production. VeTek Semiconductor looks forward to becoming your long-term partner in China.
  • High Pure Silicon Carbide Wafer Carrier

    High Pure Silicon Carbide Wafer Carrier

    VeTek Semiconductor High Pure Silicon Carbide Wafer Carrier are important components in semiconductor processing, designed to safely hold and transport delicate silicon wafers, playing a key role in all stages of manufacturing. VeTek Semiconductor's High Pure Silicon Carbide Wafer Carrier are carefully designed and manufactured to ensure excellent performance and reliability. VeTek Semiconductor is committed to providing quality products at competitive prices, and we look forward to being your long-term partner in China.
  • Related Blog
  • Reviews

  • Different technical routes of SiC epitaxial growth furnace

    Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

  • Application of TaC-Coated Graphite Parts in Single Crystal Furnaces

    In the growth of SiC and AlN single crystals using the physical vapor transport (PVT) method, crucial components such as the crucible, seed holder, and guide ring play a vital role. As depicted in Figure 2 [1], during the PVT process, the seed crystal is positioned in the lower temperature region, while the SiC raw material is exposed to higher temperatures (above 2400 ℃).

  • What challenges does the CVD TaC coating process for SiC single crystal growth face in semiconductor processing?

    The article analyzes the specific challenges faced by the CVD TaC coating process for SiC single crystal growth during semiconductor processing, such as material source and purity control, process parameter optimization, coating adhesion, equipment maintenance and process stability, environmental protection and cost control, as well as the corresponding industry solutions.

  • Semiconductor process: Chemical Vapor Deposition (CVD)

    Chemical vapor deposition (CVD) in semiconductor manufacturing is used to deposit thin film materials in the chamber, including SiO2, SiN, etc., and commonly used types include PECVD and LPCVD. By adjusting the temperature, pressure and reaction gas type, CVD achieves high purity, uniformity and good film coverage to meet different process requirements.

  • What is CVD TAC Coating? - Veteksemi

    CVD TAC coating is a process for forming a dense and durable coating on a substrate (graphite). This method involves depositing TaC onto the substrate surface at high temperatures, resulting in a tantalum carbide (TaC) coating with excellent thermal stability and chemical resistance.

  • Why does SiC coated Graphite Susceptor fail? - VeTek Semiconductor

    During the SiC epitaxial growth process, SiC coated graphite suspension failure may occur. This paper conducts a rigorous analysis of the failure phenomenon of SiC coated graphite suspension, which mainly includes two factors: SiC epitaxial gas failure and SiC coating failure.

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