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    • China sic epi wafers Manufacturer, Supplier, Factory

    As a professional sic epi wafers manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable sic epi wafers made in China, you can leave us a message.

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    • Wafer Carrier Tray

      Wafer Carrier Tray

      Vetek Semiconductor specializes in partnering with its customers to produce custom designs for Wafer Carrier Tray. Wafer Carrier tray can be designed for use in CVD silicon epitaxy, III-V epitaxy, and III-Nitride epitaxy, Silicon carbide epitaxy. Please contact Vetek semiconductor regarding your susceptor requirements.
    • Epi wafer holder

      Epi wafer holder

      VeTek Semiconductor is a professional Epi Wafer Holder manufacturer and factory in China. Epi Wafer Holder is a wafer holder for the epitaxy process in semiconductor processing. It is a key tool to stabilize the wafer and ensure uniform growth of the epitaxial layer. It is widely used in epitaxy equipment such as MOCVD and LPCVD. It is an irreplaceable device in the epitaxy process. Welcome your further consultation.
    • PECVD Graphite Boat

      PECVD Graphite Boat

      Vetek Semiconductor's PECVD graphite boat optimizes solar cell coating processes by spacing silicon wafers effectively and inducing glow discharge for uniform coating deposition. With advanced technology and material choices, Vetek semiconductor's PECVD graphite boats enhance silicon wafer quality and boost solar energy conversion efficiency.Pls no hesitate to inquiry us.
    • SiC Coating Inlet Ring

      SiC Coating Inlet Ring

      Vetek Semiconductor excels in collaborating closely with clients to craft bespoke designs for SiC Coating Inlet Ring tailored to specific needs. These SiC Coating Inlet Ring are meticulously engineered for diverse applications such as CVD SiC equipment and Silicon carbide epitaxy. For tailored SiC Coating Inlet Ring solutions, do not hesitate to reach out to Vetek Semiconductor for personalized assistance.
    • Tantalum Carbide Coated Planetary Rotation Disk

      Tantalum Carbide Coated Planetary Rotation Disk

      VeTek Semiconductor is a leading Tantalum Carbide Coated Planetary Rotation Disk manufacturer and innovator in China.We have been specialized in ceramic coating for many years.Our products have a high purity and high temperature resistance.We look forward to becoming your long-term partner in China.
    • High Purity Graphite Paper

      High Purity Graphite Paper

      The high purity graphite paper provided by VeTek Semiconductor is a reliable and efficient sealing solution. High-purity graphite paper is a sealing material made of advanced graphite materials with excellent performance and reliability. It has excellent high-temperature resistance and can withstand sealing requirements under extreme temperature conditions. We look forward to becoming your long-term partner in China.
    • Related Blog
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    • Why is SiC coating a key core material for SiC epitaxial growth?

      This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

    • A complete explanation of the chip manufacturing process (1/2): from wafer to packaging and testing

      The semiconductor manufacturing process involves eight steps: wafer processing, oxidation, lithography, etching, thin film deposition, interconnection, testing, and packaging. Silicon from sand is processed into wafers, oxidized, patterned, and etched for high-precision circuits.

    • Chip manufacturing: A process flow of MOSFET

      The chip manufacturing process includes photolithography,etching, diffusion, thin film, ion implantation, chemical mechanical polishing, cleaning, etc. This article roughly explains how these processes are integrated in sequence to manufacture a MOSFET.

    • The Problems in the Etching Process

      Etching technology in semiconductor manufacturing often encounters problems such as loading effect, micro-groove effect and charging effect, which affect product quality. Improvement solutions include optimizing plasma density, adjusting reaction gas composition, improving vacuum system efficiency, designing reasonable lithography layout, and selecting appropriate etching mask materials and process conditions.

    • Based on 8-inch silicon carbide single crystal growth furnace technology

      Silicon carbide is one of the ideal materials for making high-temperature, high-frequency, high-power and high-voltage devices. In order to improve production efficiency and reduce costs, the preparation of large-size silicon carbide substrates is an important development direction.

    • Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

      Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.

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