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    • China SiC coated Wafer holder Manufacturer, Supplier, Factory

    As a professional SiC coated Wafer holder manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable SiC coated Wafer holder made in China, you can leave us a message.

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      Tantalum Carbide Coated Cover

      VeTek Semiconductor is a leading Tantalum Carbide Coated Cover manufacturer and innovator in China.We have been specialized in TaC and SiC coating for many years.Our products have a corrosion resistance, high strength. We look forward to becoming your long-term partner in China.
    • Silicon Carbide Wafer Boat for Horizontal Furnace

      Silicon Carbide Wafer Boat for Horizontal Furnace

      VeTek Semiconductor is a professional manufacturer and supplier in China for silicon carbide wafer boat for horizontal furnace, with years of experience in R&D and production, can control the quality well and offer a competitive price. You can rest assured to buy the silicon carbide wafer boat for horizontal furnace from us.
    • High purity Rigid felt tube

      High purity Rigid felt tube

      VeTek Semiconductor high purity rigid felt tubes are the first choice for high-temperature applications in the semiconductor industry. Their high compressive strength and excellent thermal insulation properties make them reliable and efficient components in the crystal growth process. VeTek Semiconductor has always been committed to providing advanced and reliable high-purity rigid felt tube technology and product solutions for the semiconductor industry. We welcome your further inquiries.
    • CVD SiC coating ring

      CVD SiC coating ring

      The CVD SiC coating ring is one of the important parts of the halfmoon parts. Together with other parts, it forms the SiC epitaxial growth reaction chamber. VeTek Semiconductor is a professional CVD SiC coating ring manufacturer and supplier. According to the customer's design requirements, we can provide the corresponding CVD SiC coating ring at the most competitive price. VeTek Semiconductor looks forward to becoming your long-term partner in China.
    • 8 Inch Halfmoon Part for LPE Reactor

      8 Inch Halfmoon Part for LPE Reactor

      VeTek Semiconductor is a leading 8 Inch Halfmoon Part for LPE Reactor manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a 8 Inch Halfmoon Part for LPE Reactor designed specifically for LPE SiC epitaxy reactor. This halfmoon part a versatile and efficient solution for semiconductor manufacturing with its optimal size, compatibility, and high productivity.We welcome you to visit our factory in China.
    • CVD SiC coating rigid felt

      CVD SiC coating rigid felt

      As an important part of the SiC coating halfmoon graphite parts, CVD SiC coating rigid felt plays an important role in heat preservation during the SiC epitaxial growth process. VeTek Semiconductor is a mature CVD SiC coating rigid felt manufacturer and supplier, which can provide customers with suitable and excellent CVD SiC coating rigid felt products. VeTek Semiconductor looks forward to becoming your long-term partner in the epitaxial industry.
    • Related Blog
    • Reviews

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

    • How to prepare CVD TaC coating?

      This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • A complete explanation of the chip manufacturing process (2/2): from wafer to packaging and testing

      Thin film deposition is vital in chip manufacturing, creating micro devices by depositing films under 1 micron thick via CVD, ALD, or PVD. These processes build semiconductor components through alternating conductive and insulating films.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

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