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  • LPE SiC EPI Halfmoon

    • China LPE SiC EPI Halfmoon Manufacturer, Supplier, Factory

    As a professional LPE SiC EPI Halfmoon manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable LPE SiC EPI Halfmoon made in China, you can leave us a message.

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    • Silicon Carbide Wafer Boat for Horizontal Furnace

      Silicon Carbide Wafer Boat for Horizontal Furnace

      VeTek Semiconductor is a professional manufacturer and supplier in China for silicon carbide wafer boat for horizontal furnace, with years of experience in R&D and production, can control the quality well and offer a competitive price. You can rest assured to buy the silicon carbide wafer boat for horizontal furnace from us.
    • SiC Coating Cover Segments

      SiC Coating Cover Segments

      Vetek Semiconductor is dedicated to the advancement and commercialization of CVD SiC coating and CVD TaC coating. As an illustration, our SiC Coating Cover Segments undergoes meticulous processing, resulting in a dense CVD SiC coating with exceptional precision. It exhibits remarkable resistance to high temperatures and offers robust protection against corrosion. We welcome your inquiries.
    • Silicon Carbide Shower Head

      Silicon Carbide Shower Head

      VeTek Semiconductor is a leading manufacturer and supplier of Silicon Carbide Shower Head products in China. SiC Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation.
    • TaC Coated Graphite Susceptor

      TaC Coated Graphite Susceptor

      VeTek Semiconductor’s TaC Coated Graphite Susceptor uses chemical vapor deposition(CVD) method to prepare tantalum carbide coating on the surface of graphite parts. This process is the most mature and has the best coating properties. TaC Coated Graphite Susceptor can extend the service life of graphite components, inhibit the migration of graphite impurities, and ensure the quality of epitaxy. VeTek Semiconductor is looking forward to your inquiry.
    • MOCVD Susceptor

      MOCVD Susceptor

      Vetek Semiconductor focuses on the research and development and industrialization of CVD SiC coating and CVD TaC coating. Taking MOCVD Susceptor as an example, the product is highly processed with high precision, dense CVD SIC coating, high temperature resistance and strong corrosion resistance. An inquiry into us is welcome.
    • Porous Ceramic Vacuum Chuck

      Porous Ceramic Vacuum Chuck

      As a professional Porous Ceramic Vacuum Chuck manufacturer and supplier in China, Vetek Semiconductor's Porous Ceramic Vacuum Chuck is made of silicon carbide ceramic (SiC) material, which has excellent high temperature resistance, chemical stability and mechanical strength. It is an indispensable core component in the semiconductor manufacturing process. Welcome your further inquiries.
    • Related Blog
    • Reviews

    • Chinese companies are reportedly developing 5nm chips with Broadcom!

      According to overseas news, two sources revealed on June 24 that ByteDance is working with US chip design company Broadcom to develop an advanced artificial intelligence (AI) computing processor, which will help ByteDance ensure an adequate supply of high-end chips amid tensions between China and the United States.

    • How to prepare CVD TaC coating?

      This article introduces the product characteristics of CVD TaC coating, the process of preparing CVD TaC coating using the CVD method, and the basic method for surface morphology detection of the prepared CVD TaC coating.

    • What is semiconductor epitaxy process?

      It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

    • The Development History of 3C SiC

      Through continuous technological progress and in-depth mechanism research, 3C-SiC heteroepitaxial technology is expected to play a more important role in the semiconductor industry and promote the development of high-efficiency electronic devices.

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

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