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    • China Silicon epitaxial Manufacturer, Supplier, Factory

    As a professional Silicon epitaxial manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Silicon epitaxial made in China, you can leave us a message.

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    • Silicon Carbide Ceramic Coating

      Silicon Carbide Ceramic Coating

      As a professional Silicon Carbide Ceramic Coating manufacturer and supplier in China, Vetek Semiconductor's Silicon Carbide Ceramic Coating is widely used on key components of semiconductor manufacturing equipment, especially when CVD and PECVD processes are involved. Welcome your inquiry.
    • SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

      SiC Coated Pancake Susceptor for LPE PE3061S 6'' Wafers

      VeTek Semiconductor is a leading SiC Coated Pancake Susceptor for LPE PE3061S 6'' wafers manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC-coated pancake susceptor designed specifically for LPE PE3061S 6” wafers. This epitaxial susceptor features high corrosion resistance, good heat conduction performance, good uniformity.We welcome you to visit our factory in China.
    • Physical Vapor Deposition

      Physical Vapor Deposition

      Vetek semiconductor Physical Vapor Deposition (PVD) is an advanced process technology widely used in surface treatment and thin film preparation. PVD technology uses physical methods to directly transform materials from solid or liquid to gas and form a thin film on the surface of the target substrate. This technology has the advantages of high precision, high uniformity and strong adhesion, and is widely used in semiconductors, optical devices, tool coatings and decorative coatings. Welcome to discuss with us!
    • TaC Coated Graphite Susceptor

      TaC Coated Graphite Susceptor

      VeTek Semiconductor’s TaC Coated Graphite Susceptor uses chemical vapor deposition(CVD) method to prepare tantalum carbide coating on the surface of graphite parts. This process is the most mature and has the best coating properties. TaC Coated Graphite Susceptor can extend the service life of graphite components, inhibit the migration of graphite impurities, and ensure the quality of epitaxy. VeTek Semiconductor is looking forward to your inquiry.
    • TaC Coating Chuck

      TaC Coating Chuck

      VeTek Semiconductor's TaC Coating Chuck features a high-quality TaC coating,known for its outstanding high-temperature resistance and chemical inertness, particularly in silicon carbide (SiC) epitaxy(EPI) processes. With its exceptional features and superior performance, our TaC Coating Chuck offers several key advantages.We are committed to providing quality products at competitive prices and look forward to being your long-term partner in China.
    • 8 Inch Halfmoon Part for LPE Reactor

      8 Inch Halfmoon Part for LPE Reactor

      VeTek Semiconductor is a leading 8 Inch Halfmoon Part for LPE Reactor manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a 8 Inch Halfmoon Part for LPE Reactor designed specifically for LPE SiC epitaxy reactor. This halfmoon part a versatile and efficient solution for semiconductor manufacturing with its optimal size, compatibility, and high productivity.We welcome you to visit our factory in China.
    • Related Blog
    • Reviews

    • What is the temperature gradient of the thermal field of a single crystal furnace?

      The article explains the temperature gradient in a single-crystal furnace. It covers the static and dynamic heat fields during crystal growth, the solid-liquid interface, and the temperature gradient's role in solidification.

    • What is semiconductor epitaxy process?

      It is ideal to build integrated circuits or semiconductor devices on a perfect crystalline base layer. The epitaxy (epi) process in semiconductor manufacturing aims to deposit a fine single-crystalline layer, usually about 0.5 to 20 microns, on a single-crystalline substrate. The epitaxy process is an important step in the manufacture of semiconductor devices, especially in silicon wafer manufacturing.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • Exploratory application of 3D printing technology in the semiconductor industry

      In an era of rapid technological development, 3D printing, as an important representative of advanced manufacturing technology, is gradually changing the face of traditional manufacturing. With the continuous maturity of technology and the reduction of costs, 3D printing technology has shown broad application prospects in many fields such as aerospace, automobile manufacturing, medical equipment, and architectural design, and has promoted the innovation and development of these industries.

    • How to solve the problem of sintering cracks in silicon carbide ceramics? - VeTek semiconductor

      This article mainly describes the broad application prospects of silicon carbide ceramics. It also focuses on the analysis of the causes of sintering cracks in silicon carbide ceramics and the corresponding solutions.

    • GaN-based low-temperature epitaxy technology

      This article mainly describes GaN-based low-temperature epitaxial technology, including the crystal structure of GaN-based materials, 3. epitaxial technology requirements and implementation solutions, the advantages of low-temperature epitaxial technology based on PVD principles, and the development prospects of low-temperature epitaxial technology.

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