China Porous Graphite Crucible Manufacturer, Supplier, Factory

VeTek Semiconductor is committed to providing high-quality Soft Felt for Furnace Heat Insulation. It is made of carbon fiber or graphite fiber interwoven with each other, and has excellent thermal insulation and high temperature resistance. Whether it is in industrial heating furnaces, high-temperature equipment or other occasions that require thermal insulation, our Soft Felt for Furnace Heat Insulation can meet your needs. VeTek Semiconductor looks forward to establishing a long-term cooperative relationship with you.

CVD SiC coated wafer Barrel holder is the key component of epitaxial growth furnace, widely used in MOCVD epitaxial growth furnaces. VeTek Semiconductor provides you with highly customized products. No matter what your needs are for CVD SiC coated wafer Barrel holder, Welcome to consult us.

Vetek Semiconductor Crucible for Monocrystalline Silicon are essential for achieving single-crystal growth, a cornerstone of semiconductor device manufacturing. These crucibles are meticulously designed to meet the rigorous standards of the semiconductor industry, ensuring peak performance and efficiency in all applications. At Vetek Semiconductor, we are dedicated to manufacturing and supplying high-performance crucibles for crystal growth that combine quality with cost-efficiency.

As a leading manufacturer and supplier of diffusion furnace equipment in China, VeTek Semiconductor SiC Diffusion Furnace Tube has significantly high bending strength, excellent resistance to oxidation, corrosion resistance, high wear resistance, and excellent high-temperature mechanical properties. Making it an indispensable equipment material in diffusion furnace applications. VeTek Semiconductor is committed to manufacturing and supplying high-quality SiC Diffusion Furnace Tube, and welcomes your further inquiries.

VeTek Semiconductor is a professional manufacturer of Porous Graphite, CVD SiC coating, and CVD TAC COATING graphite susceptor in China. In fact, as a core consumable in the semiconductor manufacturing process, Porous Graphite plays an irreplaceable role in multiple links such as crystal growth, doping, and annealing. VeTek Semiconductor is committed to providing high-quality products at competitive prices, and we look forward to becoming your long-term partner in China.

Vetek Semiconductor’s CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications.Looking forward to setting up long term cooperation with you.