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    • China Hot Zone graphite heater Manufacturer, Supplier, Factory

    As a professional Hot Zone graphite heater manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Hot Zone graphite heater made in China, you can leave us a message.

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    • Glassy Carbon Coated Graphite Crucible

      Glassy Carbon Coated Graphite Crucible

      VeTek Semiconductor is a leading supplier of customized Glassy Carbon Coated Graphite Crucible in China, specializing in glassy carbon materials for many years.Our Glassy Carbon Coated Graphite Crucible is meticulously engineered to deliver exceptional performance specifically for E-beam Guns, silicon single crystal pulling, epitaxy. It offers enhanced durability against scratching and other friction, also reduces the generation of dust.Welcome to visit us.
    • Three-petal Graphite Crucible

      Three-petal Graphite Crucible

      VeTek Semiconductor's Three-petal Graphite Crucible is a special container designed for the thermal treatment of semiconductor materials, especially for the production of single crystals. It plays a vital role in controlling the growth of single crystal structures required for the manufacture of semiconductor devices. VeTek Semiconductor's looks forward to becoming your long-term partner in China.
    • SiC Coated Graphite Susceptor for MOCVD

      SiC Coated Graphite Susceptor for MOCVD

      VeTek Semiconductor is a leading manufacturer and supplier of SiC Coated Graphite Susceptor for MOCVD in China, specializing in SiC coating applications and epitaxial semiconductor products for the semiconductor industry. Our MOCVD SiC coated graphite susceptors offer competitive quality and pricing, serving markets across Europe and America. We are committed to becoming your long-term, trusted partner in advancing semiconductor manufacturing.
    • Aixtron Satellite wafer carrier

      Aixtron Satellite wafer carrier

      As a professional Aixtron Satellite Wafer Carrier product manufacturer and innovator in China, VeTek Semiconductor’s Aixtron Satellite Wafer Carrier is a wafer carrier used in AIXTRON equipment, mainly used in MOCVD processes in semiconductor processing, and is particularly suitable for high-temperature and high-precision semiconductor processing processes. The carrier can provide stable wafer support and uniform film deposition during MOCVD epitaxial growth, which is essential for the layer deposition process. Welcome your further consultation.
    • CVD SiC Shower Head

      CVD SiC Shower Head

      VeTek Semiconductor is a leading CVD SiC Shower Head manufacturer and innovator in China.We have been specialized in SiC material for many years.CVD SiC Shower Head is chosen as a focusing ring material due to its excellent thermochemical stability, high mechanical strength and resistance to plasma erosion.We look forward to becoming your long-term partner in China.
    • CVD SiC Coated Skirt

      CVD SiC Coated Skirt

      VeTek Semiconductor is a leading manufacturer, innovator and leader of CVD SiC Coating and TAC Coating in China. For many years, we have been focusing on various CVD SiC Coating products such as CVD SiC coated Skirt, CVD SiC Coating Ring, CVD SiC Coating carrier, etc. VeTek Semiconductor supports customized product services and satisfactory product prices, and looks forward to your further consultation.
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      This article mainly discusses the respective process advantages and differences of Molecular Beam Epitaxy process and Metal-organic chemical vapour deposition technologies.

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      The article analyzes the material properties of semiconductor substrate wafers such as silicon, GaAs, SiC and GaN

    • Thermal Field Design for SiC Single Crystal Growth

      With the growing demand for SiC materials in power electronics, optoelectronics and other fields, the development of SiC single crystal growth technology will become a key area of ​​scientific and technological innovation. As the core of SiC single crystal growth equipment, thermal field design will continue to receive extensive attention and in-depth research.

    • What is the difference between epitaxy and ALD?

      The main difference between epitaxy and atomic layer deposition (ALD) lies in their film growth mechanisms and operating conditions. Epitaxy refers to the process of growing a crystalline thin film on a crystalline substrate with a specific orientation relationship, maintaining the same or similar crystal structure. In contrast, ALD is a deposition technique that involves exposing a substrate to different chemical precursors in sequence to form a thin film one atomic layer at a time.

    • Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

      Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.

    • Application of carbon-based thermal field materials in silicon carbide crystal growth

      Silicon carbide (SiC)'s Key growth methods include PVT, TSSG, and HTCVD, each with distinct advantages and challenges. Carbon-based thermal field materials like insulation systems, crucibles, TaC coatings, and porous graphite enhance crystal growth by providing stability, thermal conductivity, and purity, essential for SiC's precise fabrication and application.

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