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  • Semiconductor Wafer Carrier

    • China Semiconductor Wafer Carrier Manufacturer, Supplier, Factory

    As a professional Semiconductor Wafer Carrier manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Semiconductor Wafer Carrier made in China, you can leave us a message.

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    • Tantalum Carbide TaC Coated Halfmoon

      Tantalum Carbide TaC Coated Halfmoon

      VeTek Semiconductor is the leading manufacturer and supplier in China for Tantalum Carbide TaC Coated Halfmoon, we specialized in R&D and production,can control the quality well and offer a competitive price. You are welcome to visit our factory for further discussion on a long-term cooperation.
    • TaC Coating Rotation Susceptor

      TaC Coating Rotation Susceptor

      As a professional manufacturer, innovator and leader of TaC Coating Rotation Susceptor products in China. VeTek Semiconductor TaC Coating Rotation Susceptor is usually installed in chemical vapor deposition (CVD) and molecular beam epitaxy (MBE) equipment to support and rotate wafers to ensure uniform material deposition and efficient reaction. It is a key component in semiconductor processing. Welcome your further consultation.
    • Aixtron Satellite wafer carrier

      Aixtron Satellite wafer carrier

      As a professional Aixtron Satellite Wafer Carrier product manufacturer and innovator in China, VeTek Semiconductor’s Aixtron Satellite Wafer Carrier is a wafer carrier used in AIXTRON equipment, mainly used in MOCVD processes in semiconductor processing, and is particularly suitable for high-temperature and high-precision semiconductor processing processes. The carrier can provide stable wafer support and uniform film deposition during MOCVD epitaxial growth, which is essential for the layer deposition process. Welcome your further consultation.
    • Carbon Carbon Composite PECVD Pallet

      Carbon Carbon Composite PECVD Pallet

      VeTek Semiconductor is a leading Carbon Carbon Composite PECVD Pallet manufacturer and innovator in China.We have been specialized in Carbon related material for many years.Our products are made of high density carbon fiber. We look forward to becoming your long-term partner in China.
    • SiC Crystal Growth Porous Graphite

      SiC Crystal Growth Porous Graphite

      As the leading SiC Crystal Growth Porous Graphite manufacturer and leader in China's semiconductor industry, VeTek Semiconductor has been focusing on various Porous Graphite products for many years, such as Porous graphite crucible, High Purity Porous Graphite, SiC Crystal Growth Porous Graphite, Porous Graphite with TaC Coated's investment and R&D, our Porous Graphite products have won high praise from European and American customers. We sincerely look forward to becoming your partner in China.
    • Porous Tantalum Carbide

      Porous Tantalum Carbide

      VeTek Semiconductor is a professional manufacturer and leader of Porous Tantalum Carbide products in China. Porous Tantalum Carbide is usually manufactured by chemical vapor deposition (CVD) method, ensuring precise control of its pore size and distribution, and is a material tool dedicated to high temperature extreme environments. Welcome your further consultation.
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    • Tantalum carbide technology breakthrough, SiC epitaxial pollution reduced by 75%?

      Recently, the German research institute Fraunhofer IISB has made a breakthrough in the research and development of tantalum carbide coating technology, and developed a spray coating solution that is more flexible and environmentally friendly than the CVD deposition solution, and has been commercialized.

    • Different technical routes of SiC epitaxial growth furnace

      Silicon carbide substrates have many defects and cannot be processed directly. A specific single crystal thin film needs to be grown on them through an epitaxial process to make chip wafers. This thin film is the epitaxial layer. Almost all silicon carbide devices are realized on epitaxial materials. High-quality silicon carbide homogeneous epitaxial materials are the basis for the development of silicon carbide devices. The performance of epitaxial materials directly determines the realization of the performance of silicon carbide devices.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

    • Principles and Technology of Physical Vapor Deposition Coating (1/2) - VeTek Semiconductor

      Vacuum coating includes film material vaporization, vacuum transportation and thin film growth. According to the different film material vaporization methods and transportation processes, vacuum coating can be divided into two categories: PVD and CVD.

    • Roll up! Two major manufacturers are about to mass produce 8-inch silicon carbide

      As the 8-inch silicon carbide (SiC) process matures, manufacturers are accelerating the shift from 6-inch to 8-inch. Recently, ON Semiconductor and Resonac announced updates on 8-inch SiC production.

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

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    Semiconductor Wafer Carrier for MOCVD Equipment

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