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  • Soft Felt for Heat Insulation

    • China Soft Felt for Heat Insulation Manufacturer, Supplier, Factory

    As a professional Soft Felt for Heat Insulation manufacturer and supplier in China, we have our own factory. Whether you need customized services to meet the specific needs of your region or want to buy advanced and durable Soft Felt for Heat Insulation made in China, you can leave us a message.

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    • EPI susceptor

      EPI susceptor

      VeTek Semiconductor's EPI susceptor is designed for the demanding epitaxial equipment applications. Its high-purity silicon carbide (SiC) coated graphite structure offers excellent heat resistance, uniform thermal uniformity for consistent epitaxial layer thickness and resistance, and long-lasting chemical resistance. We look forward to cooperating with you.
    • Soft Felt for Furnace Heat Insulation

      Soft Felt for Furnace Heat Insulation

      VeTek Semiconductor is committed to providing high-quality Soft Felt for Furnace Heat Insulation. It is made of carbon fiber or graphite fiber interwoven with each other, and has excellent thermal insulation and high temperature resistance. Whether it is in industrial heating furnaces, high-temperature equipment or other occasions that require thermal insulation, our Soft Felt for Furnace Heat Insulation can meet your needs. VeTek Semiconductor looks forward to establishing a long-term cooperative relationship with you.
    • Alumina Ceramic Vacuum Chuck

      Alumina Ceramic Vacuum Chuck

      VeTek Semiconductor is a professional Alumina Ceramic Vacuum Chuck manufacturer and factory in China. Alumina Ceramic Vacuum Chuck uses high-purity aluminum oxide ceramics with excellent heat resistance, chemical resistance and mechanical strength. It is mainly used to fix and support wafers and substrates. It is a high-performance equipment for semiconductor processing. Welcome your further inquiries.
    • Tantalum Carbide TaC Coated Halfmoon

      Tantalum Carbide TaC Coated Halfmoon

      VeTek Semiconductor is the leading manufacturer and supplier in China for Tantalum Carbide TaC Coated Halfmoon, we specialized in R&D and production,can control the quality well and offer a competitive price. You are welcome to visit our factory for further discussion on a long-term cooperation.
    • High Purity SiC Cantilever Paddle

      High Purity SiC Cantilever Paddle

      VeTek Semiconductor is a leading manufacturer and innovator of High Purity SiC Cantilever Paddle in China. High Purity SiC Cantilever Paddles are commonly used in semiconductor diffusion furnaces as wafer transfer or loading platforms. VeTek Semiconductor is committed to providing advanced technology and product solutions for the semiconductor industry. We look forward to becoming your long-term partner in China.
    • SiC Coated Support for LPE PE2061S

      SiC Coated Support for LPE PE2061S

      VeTek Semiconductor is a leading SiC Coated Support for LPE PE2061S manufacturer and innovator in China.We have been specialized in SiC coating material for many years.We offer a SiC Coated Support for LPE PE2061S designed specifically for LPE silicon epitaxy reactor. This SiC Coated Support for LPE PE2061S is the bottom of barrel susceptor.It can withstand 1600 degrees Celsius high temperature, extend product life of graphite spare part.Welcome to send us inquiry.
    • Related Blog
    • Reviews

    • Italy's LPE's 200mm SiC epitaxial technology progress

      This article introduces the latest developments in the newly designed PE1O8 hot-wall CVD reactor of the Italian company LPE and its ability to perform uniform 4H-SiC epitaxy on 200mm SiC.

    • What is an EPI Epitaxial Furnace? - VeTek Semiconductor

      The working principle of the epitaxial furnace is to deposit semiconductor materials on a substrate under high temperature and high pressure. Silicon epitaxial growth is to grow a layer of crystal with the same crystal orientation as the substrate and different thickness on a silicon single crystal substrate with a certain crystal orientation. This article mainly introduces the silicon epitaxial growth methods: vapor phase epitaxy and liquid phase epitaxy.

    • Chip Manufacturing: Atomic Layer Deposition (ALD)

      In the semiconductor manufacturing industry, as device size continues to shrink, the deposition technology of thin film materials has posed unprecedented challenges. Atomic Layer Deposition (ALD), as a thin film deposition technology that can achieve precise control at the atomic level, has become an indispensable part of semiconductor manufacturing. This article aims to introduce the process flow and principles of ALD to help understand its important role in advanced chip manufacturing.

    • Silicon(Si) epitaxy preparation technology

      Single crystal materials alone cannot meet the needs of the growing production of various semiconductor devices. At the end of 1959, a thin layer of single crystal material growth technology - epitaxial growth was developed.

    • Uses of solid silicon carbide

      Solid silicon carbide has excellent properties such as high temperature stability, high hardness, good abrasion resistance, and good chemical stability, so it has a wide range of applications. The following are some applications of solid silicon carbide:

    • Why is SiC coating a key core material for SiC epitaxial growth?

      This article analyzes the reasons why SiC coating a key core material for SiC epitaxial growth and focuses on the specific advantages of SiC coating in the semiconductor industry.

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