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Porous Graphite

VeTek Semiconductor is a professional manufacturer of Porous Graphite, CVD SiC coating, and CVD TAC COATING graphite susceptor in China. In fact, as a core consumable in the semiconductor manufacturing process, Porous Graphite plays an irreplaceable role in multiple links such as crystal growth, doping, and annealing. VeTek Semiconductor is committed to providing high-quality products at competitive prices, and we look forward to becoming your long-term partner in China.

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GaN on SiC epi susceptor

VeTek Semiconductor is a professional manufacturer of GaN on SiC epi susceptor, CVD SiC coating, and CVD TAC COATING graphite susceptor in China. Among them, GaN on SiC epi susceptor plays a vital role in semiconductor processing. Through its excellent thermal conductivity, high temperature processing ability and chemical stability, it ensures the high efficiency and material quality of the GaN epitaxial growth process. We sincerely look forward to your further consultation.

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CVD TaC Coating Carrier

VeTek Semiconductor's CVD TaC Coating carrier is mainly designed for the epitaxial process of semiconductor manufacturing. CVD TaC Coating carrier’s Ultra-high melting point, excellent corrosion resistance, and outstanding thermal stability determine the indispensability of this product in semiconductor epitaxial process.we sincerely hope to build a long-term business relationship with you.

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CVD SiC Coating Baffle

Vetek Semiconductor's CVD SiC Coating Baffle is mainly used in Si Epitaxy. It is usually used with silicon extension barrels. It combines the unique high temperature and stability of the CVD SiC Coating Baffle, which greatly improves the uniform distribution of airflow in semiconductor manufacturing. We believe that our products can bring you Advanced Technology and High-Quality Product Solutions.

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CVD SiC Graphite Cylinder

Vetek Semiconductor’s CVD SiC Graphite Cylinder is pivotal in semiconductor equipment, serving as a protective shield within reactors to safeguard internal components in high temperature and pressure settings. It effectively shields against chemicals and extreme heat, preserving equipment integrity. With exceptional wear and corrosion resistance, it ensures longevity and stability in challenging environments. Utilizing these covers enhances semiconductor device performance, prolongs lifespan, and mitigates maintenance requirements and damage risks.Welcome to inquiry us.

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CVD SiC Coating Nozzle

Vetek Semiconductor’s CVD SiC Coating Nozzles are crucial components used in the LPE SiC epitaxy process for depositing silicon carbide materials during semiconductor manufacturing. These nozzles are typically made of high-temperature and chemically stable silicon carbide material to ensure stability in harsh processing environments. Designed for uniform deposition, they play a key role in controlling the quality and uniformity of epitaxial layers grown in semiconductor applications.Looking forward to setting up long term cooperation with you.

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