As an advanced SiC Sealing Part product manufacturer and factory in China. VeTek Semiconducto SiC Sealing Part is a high-performance sealing component widely used in semiconductor processing and other extreme high temperature and high pressure processes. Welcome your further consultation.
Read MoreSend InquiryVeTek Semiconductor is a professional Alumina Ceramic Vacuum Chuck manufacturer and factory in China. Alumina Ceramic Vacuum Chuck uses high-purity aluminum oxide ceramics with excellent heat resistance, chemical resistance and mechanical strength. It is mainly used to fix and support wafers and substrates. It is a high-performance equipment for semiconductor processing. Welcome your further inquiries.
Read MoreSend InquiryAs a professional Hard Composite Carbon Fiber Felt product manufacturer and supplier in China, VeTek Semiconductor Hard Composite Carbon Fiber Felt is a high-quality material designed for high-temperature applications, providing excellent heat resistance and insulation performance. This product is widely used in Carbon Carbon Composite PECVD Pallet to ensure stability and reliability under extreme conditions. Welcome your further consultation.
Read MoreSend InquiryAs a professional innovator and leader of Tantalum Carbide Coated Ring products in China, VeTek semiconductor Tantalum Carbide Coated Ring plays an irreplaceable role in SiC crystal growth with its excellent high temperature resistance, wear resistance and excellent thermal conductivity. Welcome your further consultation.
Read MoreSend InquiryAs a leading manufacturer and supplier of Silicon Carbide Wafer Chuck products in China, VeTek Semiconductor's Silicon Carbide Wafer Chuck plays an irreplaceable role in the epitaxial growth process with its excellent high temperature resistance, chemical corrosion resistance and thermal shock resistance. Welcome your further consultation.
Read MoreSend InquiryVeTek Semiconductor is a leading manufacturer and supplier of Silicon Carbide Shower Head products in China. SiC Shower Head has excellent high temperature tolerance, chemical stability, thermal conductivity and good gas distribution performance, which can achieve uniform gas distribution and improve film quality. Therefore, it is usually used in high temperature processes such as chemical vapor deposition (CVD) or physical vapor deposition (PVD) processes. Welcome your further consultation.
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