High purity quartz diffusion Tube

VeTek Semiconductor's High purity quartz Diffusion Tube has the characteristics of high purity, high heat resistance, high corrosion resistance, and low expansion coefficient. These characteristics enable High purity quartz Diffusion Tube to withstand the environment of the oxidation annealing process of semiconductor wafers without deformation or damage.

VeTek Semiconductor's High purity quartz Diffusion Tube has a purity of over 99.998%, ensuring that there will be no contamination of the wafer during the wafer preparation process.

Application of Quartz Diffusion Tube in Semiconductor Oxidation Diffusion Process

The excellent thermal performance of our High purity quartz Diffusion Tube is very important in the oxidation process. High purity quartz Diffusion Tube can withstand temperatures up to 1250°C during thermal oxidation and annealing, ensuring smooth wafer processing. In addition, the insulation properties and high thermal resistance of High purity quartz Diffusion Tube ultimately ensure the consistency of wafer price processing.

VeTek Semiconductor's High purity quartz Diffusion Tube is ideal for wafer processing

In addition to oxidation, annealing is another important process in semiconductor wafer manufacturing. By heating the wafer to a certain temperature and cooling it at a controlled rate for a period of time, the purpose is to improve the microstructure and performance of the material. The key to this process is the precise control of temperature - it must be high enough to allow atoms to rearrange, but not too high to avoid irreversible damage. The holding time allows the atoms in the material to move and rearrange, which helps to eliminate lattice defects, increase grain size, etc. The cooling stage of the annealing process is also very critical, and the cooling rate can significantly affect the final crystal structure and performance.

VeTek Semiconductor High Purity Quartz Diffusion Tube provides the required thermal stability for the annealing process, allowing the wafer to anneal evenly. At the same time, the excellent thermal shock resistance of High Purity Quartz Diffusion Tube ensures its stability in the rapid heating and cooling cycles during the wafer annealing process, so that its life and reliability under the annealing process are guaranteed.

In addition to the above advantages, VeTek Semiconductor High Purity Quartz Diffusion Tube also has high UV transparency. It can be used to monitor and inspect the wafer processing process through UV light, thus improving the reliability of the final semiconductor device.

The actual requirements of different semiconductor processes are different. In order to meet these diverse needs, we are always committed to providing customers with highly customized High Purity Quartz Diffusion Tube products to meet the end-user's usage scenario requirements. Our customer customization services include various structures of High Purity Quartz Diffusion Tube itself, various flanges and other configurations. Whether it is small-scale R&D or large-scale mass production, we are competent. Looking forward to your inquiry and establishing a long-term partnership with you.

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