Vetek Semiconductor is a leading manufacturer and supplier of SiC coated E-Chucks in China. SiC coated E-Chuck is specially designed for GaN wafer etching process, with excellent performance and long service life, to provide all-round support for your semiconductor manufacturing. Our strong processing ability enables us to provide you with the SiC Ceramic Susceptor you want. Looking forward to your inquire.
As Gallium nitride (GaN) becomes the core material of the third generation semiconductor, its applications in high-frequency, high-power and optoelectronic fields continue to expand, such as 5G communication base stations, power modules and LED devices. However, in semiconductor manufacturing, especially in the etching process, wafers need to be subjected to high temperature, high chemical corrosion environment and extremely high precision process requirements, which put forward extremely high technical standards for wafer bearing tools.
Vetek Semiconductor's SiC ceramic pallets are designed for GaN wafer etching and offer high purity, excellent heat and chemical resistance to support your manufacturing process. It is suitable for plasma etching (ICP/RIE) process and is an ideal choice in modern semiconductor manufacturing equipment.
1. High purity SiC ceramic material
Chemical stability: The purity of the material is more than 99.5%, and there is no pollution to the GaN wafer.
High hardness and wear resistance: Hardness close to diamond, able to withstand high frequency use, invisible changes and scratches.
2. Excellent thermal performance
High thermal conductivity, Gan-matched Coefficient of thermal Expansion (CTE) : reduce the risk of wafer cracking in the etching process.
3. Super chemical corrosion resistance
It can work in high concentration of fluoride, chloride and other corrosive gas environment for a long time.
4. Precision design and machining
Surface roughness and flatness ensure smooth wafer placement and etching uniformity to meet high precision process requirements.
Dimensions, grooves, fixed holes and other structures can be customized according to customer requirements.
● Plasma etching (ICP/RIE)
It provides wafer fixation and support in high temperature and high chemical corrosion environment, suitable for etching process of GaN, SiC and other materials.
● Wafer transfer and storage
Provide a highly flat and pollution-free platform to protect the safety of the wafer in the manufacturing process.
Vetek Semiconductor offers customized services to meet your specific process needs:
● Size customization: pallet size can be customized according to wafer size (Ø4~12 inches).
● Structure optimization: Support groove, positioning hole, fixed point and other structure customization.